Mr. Alexander Bean Profile

Alexander Bean

at Landmark Measurement Solutions Inc

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Publications (2)

Proceedings Article | 17 November 2016 Paper

Evaluation of photomask flatness compensation for extreme ultraviolet lithography

Katherine Ballman, Christopher Lee, John Zimmerman, Thomas Dunn, Alexander Bean

Proceedings Volume 9985, 99850N (2016) https://doi.org/10.1117/12.2240956

KEYWORDS: Reticles, Extreme ultraviolet, Photomasks, Overlay metrology, Error analysis, Semiconductors, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Metrology

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Proceedings Article | 10 May 2016 Paper

Error analysis of overlay compensation methodologies and proposed functional tolerances for EUV photomask flatness

Katherine Ballman, Christopher Lee, Thomas Dunn, Alexander Bean

Proceedings Volume 9984, 99840S (2016) https://doi.org/10.1117/12.2242282

KEYWORDS: Tolerancing, Extreme ultraviolet, Error analysis, Photomasks, Reticles, Semiconducting wafers, Scanners, Lithography, Data corrections, Overlay metrology

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