Dr. Ali Mokhberi Profile

Dr. Ali Mokhberi

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Publications (8)

Proceedings Article | 18 April 2013 Paper

DSA hole defectivity analysis using advanced optical inspection tool

Ryota Harukawa, Masami Aoki, Andrew Cross, Venkat Nagaswami, Tadatoshi Tomita, Seiji Nagahara, Makoto Muramatsu, Shinichiro Kawakami, Hitoshi Kosugi, Benjamen Rathsack, Takahiro Kitano, Jason Sweis, Ali Mokhberi

Proceedings Volume 8681, 86811A (2013) https://doi.org/10.1117/12.2011177

KEYWORDS: Inspection, Semiconducting wafers, Wafer inspection, Reticles, Wafer-level optics, Epitaxy, Optical inspection, Defect inspection, Optical lithography, Directed self assembly

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Proceedings Article | 1 April 2013 Paper

Process and proximity correction, and verification for extreme ultraviolet lithography

Gökhan Perçin, Huixiong Dai, Hsu-Ting Huang, Anwei Liu, Ali Mokhberi, Xin Zheng, Chris Ngai

Proceedings Volume 8679, 86790X (2013) https://doi.org/10.1117/12.2011666

KEYWORDS: Photomasks, Calibration, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Extreme ultraviolet, Ultraviolet radiation, Metals, High volume manufacturing, Semiconductors

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Proceedings Article | 23 March 2012 Paper

Model calibration and slit position effect on full-mask process and proximity correction for extreme ultraviolet lithography

Hsu-Ting Huang, Huixiong Dai, Ali Mokhberi, Xumou Xu, Anwei Liu, Chris Ngai

Proceedings Volume 8322, 83221K (2012) https://doi.org/10.1117/12.916502

KEYWORDS: Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Finite element methods, Metals, Ultraviolet radiation, Back end of line

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Proceedings Article | 23 March 2011 Paper

Full-chip OPC and verification with a fast mask 3D model

Hsu-Ting Huang, Ali Mokhberi, Huixiong Dai, Chris Ngai

Proceedings Volume 7973, 79732R (2011) https://doi.org/10.1117/12.879841

KEYWORDS: 3D modeling, Optical proximity correction, Photomasks, 3D metrology, Semiconducting wafers, Calibration, Lithography, Scattering, Optical lithography, 3D image processing

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Proceedings Article | 23 September 2009 Paper

Model-based assist features

Bayram Yenikaya, Oleg Alexandrov, Yongjun Kwon, Anwei Liu, Ali Mokhberi, Apo Sezginer

Proceedings Volume 7488, 748815 (2009) https://doi.org/10.1117/12.829938

KEYWORDS: SRAF, Photomasks, Model-based design, Optimization (mathematics), Printing, Semiconducting wafers, Systems modeling, Resolution enhancement technologies, Optical proximity correction, Alternate lighting of surfaces

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Proceedings Article | 11 May 2009 Paper

Model-based assist features

Bayram Yenikaya, Oleg Alexandrov, Steven Chen, Anwei Liu, Ali Mokhberi, Apo Sezginer

Proceedings Volume 7379, 73792Z (2009) https://doi.org/10.1117/12.824350

KEYWORDS: SRAF, Photomasks, Model-based design, Lithography, Printing, Optimization (mathematics), Electroluminescence, Critical dimension metrology, Lithographic illumination, Systems modeling

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Proceedings Article | 20 October 2006 Paper

PPC model build methodology: sequential litho and etch verification

Ali Mokhberi, Vishnu Kamat, Apo Sezginer, Franz Zach, Gökhan Perçin, Jesus Carrero, Hsu-Ting Huang

Proceedings Volume 6349, 63491Z (2006) https://doi.org/10.1117/12.692931

KEYWORDS: Etching, Calibration, Data modeling, Semiconducting wafers, Particles, Scanning electron microscopy, Chromatic aberrations, Performance modeling, Wafer-level optics, Photomasks

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Proceedings Article | 20 March 2006 Paper

Building a computational model for process and proximity compensation

Gökhan Perçin, Hsu-Ting Huang, Franz Zach, Apo Sezginer, Ali Mokhberi

Proceedings Volume 6154, 61543N (2006) https://doi.org/10.1117/12.656501

KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Photomasks, Data modeling, Process modeling, Calibration, Lithography, Cadmium sulfide, Metrology

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Showing 5 of 8 publications

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