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Bryan Swain
at Tokyo Electron America Inc
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 5 April 2007 Paper
Application of integrated scatterometry (iODP) to detect and quantify resist profile changes due to resist batch changes in a production environment
Shahzad Ali, Linda Chen, Jason Tiffany, Anurag Yadav, Bryan Swain, David Dixon, Stephen Lickteig
Proceedings Volume 6518, 65182Q (2007) https://doi.org/10.1117/12.712085
KEYWORDS: Scatterometry, Metrology, Photoresist processing, Manufacturing, Lithography, Semiconducting wafers, Critical dimension metrology, Control systems, Environmental sensing, Time metrology
Proceedings Article | 10 May 2005 Paper
A comprehensive comparison of spectral scatterometry hardware
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600783
KEYWORDS: Critical dimension metrology, Scatterometry, Reflectance spectroscopy, Reflectometry, Metrology, Spectroscopy, Reflectivity, Logic, Data modeling, Lithography
Proceedings Article | 24 May 2004 Paper
Logic gate scanner focus control in high-volume manufacturing using scatterometry
Richard Dare, Bryan Swain, Michael Laughery
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533835
KEYWORDS: Scanners, Process control, Lithography, Semiconducting wafers, Control systems, Photoresist materials, Scatterometry, Logic devices, Scanning electron microscopy, Photoresist processing
Proceedings Article | 24 May 2004 Paper
Scatterometry feasibility studies for 0.13-micron flash memory lithography applications: enabling integrated metrology
Kevin Lensing, Clint Miller, Geoff Chudleigh, Bryan Swain, Michael Laughery, Anita Viswanathan
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533813
KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Lithography, Scatterometry, Metals, Process control, Reflectometry, Aluminum, Scanning electron microscopy
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