Mr. Chung-Hsing Chang Profile

Chung-Hsing Chang

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Publications (8)

Proceedings Article | 14 October 2011 Paper

Freeform source optimization for improving litho-performance of warm spots

Chun-Wei Wu, Chun-Cheng Liao, Chiang-Lin Shih, Chung-Hsing Chang, Stephen Hsu, Hua-Yu Liu, Zhipan Li

Proceedings Volume 8166, 81663C (2011) https://doi.org/10.1117/12.896978

KEYWORDS: Nanoimprint lithography, Diffractive optical elements, Source mask optimization, Critical dimension metrology, Photomasks, Optical proximity correction, Photovoltaics, Lithographic illumination, Image enhancement

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As lithography moves into lower k₁ imaging, traditional illumination "source" shapes may perform marginally in resolving complex layouts. Subsequently hot-spots or warm-spots can result, leading to yield loss in production. Typically, lithographers solve such problems by modifying the local layout instead of optimizing the DOE (diffractive optical element) illumination shape. FlexRay^TM can easily implement freeform source shapes and allows a high degree of freedom in source optimization. Therefore, it becomes practical to use pixelated freeform sources to resolve hot spots or warm spots. In this paper, we investigate the use of freeform source optimization (SO) on a critical dynamic random access memory (DRAM) layer with warm spots to verify the effectiveness of a SO only flow using Tachyon SMO. In order to improve the warm spots without changing baseline performance for other patterns, we optimized not only the warm spot patterns of concern but also the critical reference patterns. Since the optimization minimizes EPE (edge placement error) and maximizes imaging quality for all enclosed patterns, the final optimized source shape performs similar to the baseline source for the base patterns while improving the performance of the warm spot pattern areas. Although the SO source is similar in shape to the baseline source, the optimized source provides enhanced depth of focus (DoF) for all warm spot patterns without suffering degradation in the normalized image log-slope (NILS) performance. Evaluation of the optimized SO source shows no obvious negative impact on modeled CDs across an array of L/S pattern combinations which cover all the pitches appearing in the periphery. Finally, the optimized source is demonstrated using ASML's FlexRay^TM for on-wafer evaluation. According to the observations from on-wafer experiments, consistent results to simulation are verified. Overall DoF for the identified warm spot patterns is definitely improved and no obvious pattern shape changes are found, as well. From the positive demonstration in simulation and on-wafer verification, the vast flexibility of the freeform source enables the SO flow with more powerful capability to improve local hot spot or warm spot problems without negatively impacting the other patterns.

Proceedings Article | 12 December 2009 Paper

Model-based scanner tuning for process optimization

Tsung-Chih Chien, C. Y. Shih, R. C. Peng, H. H. Liu, Y. C. Chen, H. J. Lee, John Lin, K. W. Chang, C. M. Wu, W. H. Hung, Tommy Lee, H. C. Wu, X. Xie, W. J. Shao, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh

Proceedings Volume 7520, 75201Q (2009) https://doi.org/10.1117/12.842551

KEYWORDS: Scanners, Semiconducting wafers, Calibration, Lithography, Yield improvement, Model-based design, Data modeling, Wafer-level optics, Optimization (mathematics), Process modeling

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Proceedings Article | 16 March 2009 Paper

Model-based scanner tuning in a manufacturing environment

C. Y. Shih, R. C. Peng, T. C. Chien, Y. W. Guo, J. Y. Lee, C. L. Chang, P. C. Huang, H. H. Liu, H. J. Lee, John Lin, K. W. Chang, C. P. Yeh, W. J. Shao, H. Cao, A. Bruguier, X. Xie, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh

Proceedings Volume 7274, 72740T (2009) https://doi.org/10.1117/12.813974

KEYWORDS: Scanners, Semiconducting wafers, Data modeling, Calibration, Lithography, Manufacturing, Model-based design, Optical proximity correction, Wafer-level optics, Reticles

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Proceedings Article | 27 December 2002 Paper

Alt-PSM of contact with phase-assist feature for 65-nm node

Jan-Wen You, Jaw-Jung Shin, Chung-Hsing Chang, Li-Wei Kung, Bin-Chang Chang, Chang-Min Dai, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467499

KEYWORDS: Photomasks, Resolution enhancement technologies, Etching, Wet etching, Optical lithography, Dry etching, Semiconducting wafers, Chromium, Reticles, Phase shifts

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Proceedings Article | 1 August 2002 Paper

Defect dispositioning using mask printability analysis on alternating phase-shifting masks

Chung-Hsing Chang, Chen-Hao Hsieh, San-De Tzu, Chang-Min Dai, Burn Lin, Linyong Pang, Qi-De Qian, Jiunn-Hung Chen, Jason Huang

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476976

KEYWORDS: Semiconducting wafers, Photomasks, Inspection, Scanning electron microscopy, Reticles, Phase shifts, Virtual reality, Printing, Phase shifting, Reflectivity

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Proceedings Article | 11 March 2002 Paper

Alternating phase shifting mask implementation to 0.1-um logic gates

Chung-Hsing Chang, San-De Tzu, Chen-Hao Hsieh, Chang-Min Dai, Burn Lin, Chia-Hui Lin, Hua-Yu Liu

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458313

KEYWORDS: Critical dimension metrology, Optical proximity correction, Photomasks, Phase shifts, Line edge roughness, Semiconducting wafers, Calibration, Binary data, Phase shifting, Logic devices

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Proceedings Article | 5 September 2001 Paper

Utilization of assisting features in contact-hole mask repair

Chia-Yang Chang, Chung-Hsing Chang, Chuan-Yuan Lin, C. Hung, Chien-Hung Lin, John Lin

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438392

KEYWORDS: Photomasks, Quartz, Semiconducting wafers, Transmittance, Image transmission, Ion beams, Lithography, Optical fabrication, Critical dimension metrology, Optical simulations

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Proceedings Article | 26 July 1999 Paper

Customized off-axis illumination aperture filtering for sub-0.18-um KrF lithography

Chin Hsia, Tsai-Sheng Gau, Chuen-Huei Yang, Ru-Gun Liu, ChungHsing Chang, Li-Jui Chen, Chien-Ming Wang, J. Fung Chen, Bruce Smith, Gue-Wuu Hwang, JiannWen Lay, Dong-Yuan Goang

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354354

KEYWORDS: Optical proximity correction, Lithographic illumination, Optical filters, Resolution enhancement technologies, Electroluminescence, Lithography, Optical lithography, Photomasks, Modulation, Calcium

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Showing 5 of 8 publications

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