David Ure
Founder & Executive Director
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 24 March 2017 Paper
Warren Montgomery, Alexandra McClelland, David Ure, John Roth, Alex P. Robinson
Proceedings Volume 10143, 1014328 (2017) https://doi.org/10.1117/12.2258092
KEYWORDS: Extreme ultraviolet lithography, High volume manufacturing, Line edge roughness, Photoresist materials, Ions, Manufacturing, Metals, Optical lithography, Molecules, Contamination

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