Authors of the report have been developing sub-wavelength holographic lithography (SWHL) methods of aerial image
creation for IC layer topologies for the last several years. Sub-wave holographic masks (SWHM) have a number of
substantial advantages in comparison with the traditional masks, which are used in projection photo-microlithography.
The main advantage is the tolerance of SWHM to local defects. This tolerance allows considerable reduction of
manufacturing environment and post-production verification requirements.
At the report we are also going to consider another important advantage of the SWHL technology. In order to achieve
sub-wavelength resolution in this technology it is enough just to alter the number, sizes and positions of transparency
areas on the SWHM. There is no need in coating the mask with one- or multi-layer highly-local phase-shifting coat or
creating of local phase-shifting structural elements, which is usual for traditional lithography. Introducing of the object
wave with the specified phase-shift into the calculation is enough. Our research shows that such approach could be
applied to the creation of the test structures as well as to the creation of the real IC layer topologies.
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