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Fumitaka Nakajima
at INDEX Technologies Inc
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Publications (1)
Proceedings Article | 9 July 2015 Paper
Maskless lithography using point array technique for fine patterns
Fumitaka Nakajima, Eiji Ohta, Takashi Nakagawa, Masahiro Tachikawa, Nobuo Takeda, Nirou Nishimoto
Proceedings Volume 9658, 96580T (2015) https://doi.org/10.1117/12.2192930
KEYWORDS: Photoresist materials, Projection systems, Photomasks, Maskless lithography, Scanning electron microscopy, Optics manufacturing, Photography, Semiconducting wafers, Manufacturing, Optical lithography
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