Dr. Hirotaka Tsuda Profile

Dr. Hirotaka Tsuda

at Toshiba Memory Corp

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Author

Publications (4)

Proceedings Article | 23 March 2018 Paper

Process control technology for nanoimprint lithography

Hirotaka Tsuda, Hirokazu Washida, Motofumi Komori, Takuya Kono, Tetsuro Nakasugi, Wooyung Jung

Proceedings Volume 10584, 105841D (2018) https://doi.org/10.1117/12.2297332

KEYWORDS: Nanoimprint lithography, Process control, Lithography, Photoresist processing, Nanotechnology, Manufacturing, Critical dimension metrology, Photomasks, Line edge roughness, Etching

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Proceedings Article | 19 March 2018 Presentation + Paper

Design for nanoimprint lithography: hot spot modification through total NIL process simulation

Sachiko Kobayashi, Kyoji Yamashita, Hirotaka Tsuda, Kazuhiro Washida, Motofumi Komori, Ji-Young Im, Takuya Kono, Tetsuro Nakasugi

Proceedings Volume 10584, 105840R (2018) https://doi.org/10.1117/12.2297361

KEYWORDS: Nanoimprint lithography, Optical lithography, Lithography, Photoresist processing, Design for manufacturing, High volume manufacturing, Process modeling, Source mask optimization, Optical proximity correction

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Proceedings Article | 31 March 2017 Paper

RLT uniformity improvement utilizing multi-scale NIL process simulation

Sachiko Kobayashi, Ryoichi Inanami, Hirotaka Tsuda, Kazuhiro Washida, Motofumi Komori, Kyoji Yamashita, Ji-Young Im, Takuya Kono, Shimon Maeda

Proceedings Volume 10144, 101440X (2017) https://doi.org/10.1117/12.2258172

KEYWORDS: Nanoimprint lithography, Photoresist processing, Design for manufacturability, Nanolithography, Optical lithography, Ultraviolet radiation, Scatter measurement, UV optics, Lithography, Double patterning technology, Design for manufacturing, Optical microscopes, Nanotechnology, Artificial intelligence

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Proceedings Article | 8 March 2016 Paper

Scatterometry-based process control for nanoimprint lithography

Masafumi Asano, Hirotaka Tsuda, Motofumi Komori, Kazuto Matsuki, Hideaki Abe, Woo-Yung Jung

Proceedings Volume 9778, 977820 (2016) https://doi.org/10.1117/12.2218994

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Process control, Scatterometry, Etching, Manufacturing, Photoresist processing, Metrology, Image processing, Lithography, Semiconducting wafers, Optical lithography, Control systems, Photomasks

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