CONFERENCE PROCEEDINGS
Advanced Search
Dr. Liang Yang
at Karlsruher Institut fuer Technologie
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 5 March 2021 Presentation
Sensitive multi-photon photoresists: Overview and recent advances
Pascal Kiefer, Vincent Hahn, Martina Nardi, Liang Yang, Eva Blasco, Christopher Barner-Kowollik, Martin Wegener
Proceedings Volume 11677, 116770J (2021) https://doi.org/10.1117/12.2576304
KEYWORDS: Photoresist materials, Polymers, Printing, Photoresist developing, Oscillators, Materials science, Liquids, Laser systems engineering, Laser development, Laser damage threshold
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top