Mr. Masahiro Horie Profile

Masahiro Horie

Pricipal Engineer at Samsung Electronics Co Ltd

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Author

Publications (12)

Proceedings Article | 27 March 2008 Paper

Stress measurement system for process control

Kumiko Akashika, Masahiro Horie

Proceedings Volume 6922, 692231 (2008) https://doi.org/10.1117/12.772399

KEYWORDS: Semiconducting wafers, Process control, Semiconductors, Control systems, Silicon, Time metrology, Distance measurement, Objectives, Silicon films, Cameras

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Proceedings Article | 26 March 2008 Paper

Spectroscopic ellipsometer for ultra thin film

Kumiko Akashika, Shuji Shiota, Shinji Yamaguchi, Masahiro Horie, Masayoshi Kobayashi

Proceedings Volume 6922, 69223M (2008) https://doi.org/10.1117/12.772414

KEYWORDS: Thin films, Spectroscopy, Semiconductors, Spectroscopes, Ultraviolet radiation, Light sources, Light, Polarizers, Dielectric polarization, Process control

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Proceedings Article | 25 March 2008 Paper

UV-reflectometory for fast trench-depth measurement

Masahiro Horie, Shuji Shiota, Shinji Yamaguchi, Kakumichi Yamano, Masayoshi Kobayashi

Proceedings Volume 6922, 69223D (2008) https://doi.org/10.1117/12.772425

KEYWORDS: Scanning electron microscopy, Silicon, Silica, Field effect transistors, Reflectivity, Mirrors, Microscopes, Measurement devices, Photography, Optical metrology

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Proceedings Article | 25 March 2008 Paper

Film thickness measurement tool with a stress measurement function

Masahiro Horie, Kumiko Akashika, Shuji Shiota, Shinji Yamaguchi, Kakumichi Yamano

Proceedings Volume 6922, 692235 (2008) https://doi.org/10.1117/12.772416

KEYWORDS: Semiconducting wafers, Spectroscopy, Mirrors, Aspheric optics, Spectroscopic ellipsometry, Time metrology, Refractive index, Light sources, Semiconductors, Reflectance spectroscopy

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Proceedings Article | 20 October 2005 Paper

Optical metrology of binary arrays of holes in semiconductor media using microspot spectroscopic ellipsometry

Roman Antos, Ivan Ohlidal, Jan Mistrik, Tomuo Yamaguchi, Stefan Visnovsky, Shinji Yamaguchi, Masahiro Horie

Proceedings Volume 5965, 59652B (2005) https://doi.org/10.1117/12.624837

KEYWORDS: Scanning electron microscopy, Silicon, Spectroscopic ellipsometry, Semiconducting wafers, Diffraction gratings, Binary data, Diffraction, Scatterometry, Optical metrology, Optical lithography

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Proceedings Article | 27 August 2005 Paper

Airy-like internal reflection series applied in scatterometry and simulations of gratings

Roman Antos, Jan Mistrik, Tomuo Yamaguchi, Masahiro Horie, Stefan Visnovsky

Proceedings Volume 5858, 58580Y (2005) https://doi.org/10.1117/12.612496

KEYWORDS: Magnetism, Diffraction gratings, Diffraction, Polarization, Tantalum, Algorithms, Silicon, Solids, Semiconductors, Scatterometry

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Proceedings Article | 10 May 2005 Paper

Optical metrology of patterned magnetic structures: deep versus shallow gratings

Roman Antos, Martin Veis, Eva Liskova, Mitsuru Aoyama, Jaroslav Hamrle, Takashi Kimura, Pavol Gustafik, Masahiro Horie, Jan Mistrik, Tomuo Yamaguchi, Stefan Visnovsky, Naomichi Okamoto

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599653

KEYWORDS: Diffraction, Chromium, Silicon, Molybdenum, Nickel, Magnetism, Spectroscopy, Diffraction gratings, Atomic force microscopy, Oxides

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Proceedings Article | 10 May 2005 Paper

Spectroscopic ellipsometer with the smallest measurement spot

Akihiro Kinoshita, Fujikazu Kitamura, Masahiro Horie, Tomohiro Yoshida

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598683

KEYWORDS: Semiconducting wafers, Spectroscopy, Polarizers, Mirrors, Spectroscopes, Aspheric optics, Light sources, Polarization, Silicon, Optical spectroscopy

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Proceedings Article | 21 November 2003 Paper

Spectral ellipsometry of binary optic gratings

Jaromir Pistora, Tomuo Yamaguchi, Jaroslav Vlcek, Jan Mistrik, Masahiro Horie, Vasilij Smatko, Eva Kovacova, Kamil Postava, Mitsuru Aoyama

Proceedings Volume 5259, (2003) https://doi.org/10.1117/12.545175

KEYWORDS: Silicon, Ellipsometry, Diffraction, Radio propagation, Electromagnetism, Binary data, Modulation, Electromagnetic radiation, Wave propagation, Oxidation

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Proceedings Article | 2 June 2003 Paper

Measurement of the dielectric function spectra of low dielectric constant using spectroscopic ellipsometry

Masahiro Horie, Kamil Postava, Tomuo Yamaguchi, Kumiko Akashika, Hideki Hayashi, Fujikazu Kitamura

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482678

KEYWORDS: Dielectrics, Electronics, Spectroscopy, Infrared radiation, Polymers, Absorption, Spectroscopic ellipsometry, Reflectance spectroscopy, Infrared spectroscopy, Visible radiation

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Proceedings Article | 27 April 1999 Paper

Impact of built-in film thickness measurement in CMP process

Hiroyuki Yano, Katsuya Okumura, Noriyuki Kondo, Masahiro Horie

Proceedings Volume 3743, (1999) https://doi.org/10.1117/12.346938

KEYWORDS: Chemical mechanical planarization, Semiconducting wafers, Oxides, Tin, Water, Polishing, Refractive index, Time metrology, Aluminum, Microelectronics

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Proceedings Article | 21 May 1996 Paper

Spectroscopic multilayer film thickness measurement system

Masahiro Horie, Nariaki Fujiwara, Masahiko Kokubo, Hiroshi Kakiuchida

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240125

KEYWORDS: Reflectivity, Semiconducting wafers, Silicon, Spectroscopy, Lamps, Ultraviolet radiation, Reflection, Objectives, Refractive index, Multilayers

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Showing 5 of 12 publications

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