Mr. Osamu Matsuda Profile

Osamu Matsuda

at Hitachi High-Tech Science Corp

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 21 October 2014 Paper

Performance of GFIS mask repair system for various mask materials

Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka, Shingo Yoshikawa, Koichi Kanno, Hiroyuki Miyashita, Naoya Hayashi

Proceedings Volume 9235, 92350F (2014) https://doi.org/10.1117/12.2069435

KEYWORDS: Photomasks, Etching, Scanning electron microscopy, Ions, Quartz, Semiconducting wafers, Critical dimension metrology, Phase shifts, Nitrogen

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Proceedings Article | 7 April 2011 Paper

Development of new FIB technology for EUVL mask repair

Fumio Aramaki, Takashi Ogawa, Osamu Matsuda, Tomokazu Kozakai, Yasuhiko Sugiyama, Hiroshi Oba, Anto Yasaka, Tsuyoshi Amano, Hiroyuki Shigemura, Osamu Suga

Proceedings Volume 7969, 79691C (2011) https://doi.org/10.1117/12.879609

KEYWORDS: Extreme ultraviolet lithography, Ions, Etching, Extreme ultraviolet, Silicon, Image resolution, Reflectivity, Ion beams, Mirrors, Ruthenium

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Proceedings Article | 27 May 2010 Paper

FIB-CVD technology for EUV mask repair

Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka

Proceedings Volume 7748, 77481I (2010) https://doi.org/10.1117/12.867233

KEYWORDS: Chemical vapor deposition, Photomasks, Tungsten, Extreme ultraviolet, Carbon, Silicon, Gallium, Extreme ultraviolet lithography, Chemical analysis, Vacuum ultraviolet

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Proceedings Article | 23 October 2006 Paper

Advanced photomask repair technology for 65-nm lithography

Fumio Aramaki, Tomokazu Kozakai, Masashi Muramatsu, Yasuhiko Sugiyama, Yoshihiro Koyama, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Toshio Doi, Ryoji Hagiwara, Tatsuya Adachi, Anto Yasaka, Yoshiyuki Tanaka, Osamu Suga, Naoki Nishida, Youichi Usui

Proceedings Volume 6349, 63491E (2006) https://doi.org/10.1117/12.691195

KEYWORDS: Photomasks, Etching, Computer aided design, Lithography, Transmittance, Process control, Opacity, Data processing, Scanning electron microscopy, CAD systems

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Proceedings Article | 20 May 2006 Paper

Advanced photomask repair technology for 65-nm lithography

Fumio Aramaki, Tomokazu Kozakai, Yasuhiko Sugiyama, Masashi Muramatsu, Yoshihiro Koyama, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Ryoji Hagiwara, Anto Yasaka, Tatsuya Adachi, Yoshiyuki Tanaka, Osamu Suga, Naoki Nishida, Youichi Usui

Proceedings Volume 6283, 628310 (2006) https://doi.org/10.1117/12.681859

KEYWORDS: Etching, Photomasks, Quartz, Chromium, Transmittance, Scanning electron microscopy, Lithography, Visibility, Critical dimension metrology, Sensors

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Proceedings Article | 9 November 2005 Paper

Advanced photomask repair technology for 65nm lithography (4)

Yasutoshi Itou, Yoshiyuki Tanaka, Osamu Suga, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida

Proceedings Volume 5992, 59924Y (2005) https://doi.org/10.1117/12.632756

KEYWORDS: Gallium, Photomasks, Quartz, Ions, Transmittance, Lithography, Monte Carlo methods, 193nm lithography, Binary data, Opacity

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Proceedings Article | 28 June 2005 Paper

Advanced photomask repair technology for 65nm lithography (3)

Yasutoshi Itou, Yoshiyuki Tanaka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617344

KEYWORDS: Photomasks, Lithography, Opacity, Computer aided design, Atomic force microscopy, Surface conduction electron emitter displays, 193nm lithography, Control systems, Acoustics, Etching

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Proceedings Article | 6 December 2004 Paper

Advanced photomask repair technology for 65-nm lithography (2)

Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578615

KEYWORDS: Photomasks, Lithography, Etching, Computer aided design, Control systems, Surface conduction electron emitter displays, 193nm lithography, Chromium, Transmittance, Imaging systems

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Proceedings Article | 17 December 2003 Paper

Advanced FIB mask repair technology for 90-nm/ArF lithography: III

Yoshiyuki Tanaka, Yasutoshi Itou, Nobuyuki Yoshioka, Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, Yoshihiro Koyama, Hiroshi Sawaragi, Yasuhiko Sugiyama, Masashi Muramatsu, Toshio Doi, Katsumi Suzuki, Mamoru Okabe, Masashi Shinohara, Osamu Matsuda, Kazuo Aita, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Satoh, Naoya Hayashi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518026

KEYWORDS: Printing, Photomasks, Binary data, Image processing, Lithography, Ions, Opacity, Transmittance, Imaging systems, Surface conduction electron emitter displays

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Proceedings Article | 28 August 2003 Paper

Advanced FIB mask repair technology for 100-nm/ArF lithography: II

Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Osamu Matsuda, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504212

KEYWORDS: Printing, Photomasks, Binary data, Lithography, Semiconducting wafers, Imaging systems, Opacity, Ions, Scanners, Transmittance

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Showing 5 of 10 publications

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