This paper presents the outline for a real-time nano-level elastic deformation measurement system for high precision
optical metrology frames. Such a system is desirable because elastic deformation of metrology frame structures is a
leading cause for performance degradation in advanced lithography as well as metrology and inspection equipment. To
date the development of such systems was thwarted by the unavailability of sufficiently sensitive and cost effective strain
sensors. The recent introduction to the market of the IntelliVibeTM S1 strain sensors with sub nanostrain sensitivity
makes it possible to develop a real-time nanometer level elastic deformation monitoring system. In addition to the
sufficiently sensitive and cost-effective strain sensor it is necessary to develop the analytical foundation for the
measurement system and use this foundation for the development of a signal processing algorithm that will enable the
real-time reconstruction of the elastic deformation state of a metrology frame at any given time from data transmitted by
a reasonable number of properly placed S1 strain sensors. The analytical foundation and the resulting algorithms are
demonstrated in this paper.
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