CONFERENCE PROCEEDINGS
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Dr. Thomas Schuelke
at Fraunhofer USA
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 12 July 2002 Paper
Nondestructive testing of damage layers in semiconductor materials by surface acoustic waves
Dieter Schneider, Eva Stiehl, Ralf Hammer, Andreas Franke, Richard Riegert, Thomas Schuelke
Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475660
KEYWORDS: Dispersion, Acoustics, Silicon, Semiconducting wafers, Surface finishing, Polishing, Etching, Wave propagation, Gallium arsenide, Semiconductor materials
Proceedings Article | 25 August 1997 Paper
Analysis on the metal etch resist selectivity measurement
Vayalakkara Premachandran, Raymond Joy, Paul Ho, Lee Lok, Thomas Schuelke, Young Tsai
Proceedings Volume 3213, (1997) https://doi.org/10.1117/12.284631
KEYWORDS: Etching, Photoresist materials, Metals, Scanning electron microscopy, Profilometers, Photoresist developing, Photomasks, Semiconducting wafers, Aluminum, Electron microscopes
Proceedings Article | 30 May 1995 Paper
Short-time investigation of deposition processes
Thomas Witke, Peter Siemroth, Thomas Schuelke, B. Schultrich, Emil Ott
Proceedings Volume 2513, (1995) https://doi.org/10.1117/12.209567
KEYWORDS: Plasma, Cameras, High speed cameras, Optical filters, Spatial resolution, Ions, Laser ablation, Deposition processes, Microscopes, CCD cameras
Proceedings Article | 1 May 1994 Paper
Microscopical high-speed investigations of vacuum-arc cathode spots
Peter Siemroth, Thomas Schuelke, Thomas Witke
Proceedings Volume 2259, (1994) https://doi.org/10.1117/12.174639
KEYWORDS: Image resolution, Copper, Cameras, High speed cameras, Plasma, Photography, CCD cameras, Spatial resolution, Picosecond phenomena, Black bodies
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