Wenhao Pan
at ASML Shenzhen
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12056, 1205607 (2022) https://doi.org/10.1117/12.2613926
KEYWORDS: Etching, Process modeling, Data modeling, Performance modeling, Optical proximity correction, Semiconducting wafers, Scanning electron microscopy, Calibration, Model-based design, Metrology

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