Wenming Wu
at Siemens EDA
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11855, 118550E (2021) https://doi.org/10.1117/12.2601674
KEYWORDS: Photomasks, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Feature extraction, Critical dimension metrology, Metrology, OLE for process control, Image quality, Image processing

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 1161113 (2021) https://doi.org/10.1117/12.2591300
KEYWORDS: Process modeling, Semiconductor manufacturing, Control systems, Statistical analysis, Scanning electron microscopy, Process control, Calibration

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