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Ziyu Fan

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Proceedings Article | 21 March 2023 Paper

Russian quadruplet quadrupole based electron beam optics for ultrafast electron microscopy

Yi Yuan, Jian Wang, Danlei Fan, Zhengqiu Luo, Ziyu Fan, Xiaofei Li, Jinfeng Yang, Kuanjun Fan

Proceedings Volume 12595, 125951D (2023) https://doi.org/10.1117/12.2668361

KEYWORDS: Imaging systems, Matrices, Optical design, Chromatic aberrations, Ultrafast imaging

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Mega-electron-Volt Ultrafast Electron Microscope (MeV UEM) has become a promising tool to real-time observe ultrafast dynamics at the atomic scale, where a magnetic objective lens system is critical to manipulating the high-energy beam to achieve point-to-point imaging. However, the upper limit of spatial resolution is mainly determined by the high-order chromatic aberration resulting from the electron energy spread and the imaging lens system. A magnetic lens system based on the Russian Quadruplet (RQ) is being studied to improve the degree of symmetry and further reduce the aberration. The beam optics design and multi-target optimization are finished to achieve a good spatial resolution of point-to-point imaging. This paper will introduce the theoretical deviation and design results of our first-stage imaging lens system, and second-order beam optics is optimized further to improve the resolution.

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