2018 mask makers’ survey conducted by the eBeam Initiative

Aki Fujimura; Jan Willis

doi:10.1117/12.2506273

9 October 2018 2018 mask makers’ survey conducted by the eBeam Initiative

Aki Fujimura, Jan Willis

Author Affiliations +

Proceedings Volume 10810, Photomask Technology 2018; 1081002 (2018) https://doi.org/10.1117/12.2506273
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

Captive and merchant mask makers participated in an anonymous survey in the summer of 2018 to capture the profile of the mask industry for the period of July 2017 through June 2018. The eBeam Initiative’s fourth Mask Makers’ Survey in 2018 covers a number of questions related to the profile of the mask industry, from overall number of masks to pattern generation type. The survey respondents – the same 10 captive and merchant photomask manufacturers who participated in last year’s survey – reported a 27% overall increase in mask output this year as compared to last. Increases were reported in numbers of masks produced at every ground rule, but ≥5nm and <7nm, ≥16nm and <22nm, and ≥65nm and <90nm were particularly pronounced in percentage increases year over year. Respondents reported that lasers wrote 74% of the masks they produced this past year. Overall mask yields have remained steady at 94% over the last two years. The eBeam Initiative also conducts an annual Perceptions Survey of mask industry luminaries which can be found at www.ebeam.org.

Conference Presentation

Citation Download Citation

Aki Fujimura and Jan Willis "2018 mask makers’ survey conducted by the eBeam Initiative", Proc. SPIE 10810, Photomask Technology 2018, 1081002 (9 October 2018); https://doi.org/10.1117/12.2506273

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