Development progress update of the high power LPP-EUV light source using a magnetic field

Takahiro Tatsumi; Yoshifumi Ueno; Takayuki Yabu; Georg Soumagne; Shinji Nagai; Tatsuya Yanagida; Yutaka Shiraishi; Kenichi Miyao; Hideyuki Hayashi; Yukio Watanabe; Tamotsu Abe; Hiroaki Nakarai; Hakaru Mizoguchi

doi:10.1117/12.2572689

21 September 2020 Development progress update of the high power LPP-EUV light source using a magnetic field

Takahiro Tatsumi, Yoshifumi Ueno, Takayuki Yabu, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 1151717 (2020) https://doi.org/10.1117/12.2572689
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Conference Poster

Abstract

We report the status of CO2-Sn-LPP (Laser-produced-plasma) EUV light source that is being developed at Gigaphoton. Our unique and original technologies are; the combination of a pulsed CO2 laser with Sn droplets, dual wavelength laser application and Sn mitigation with a magnetic field. With these technologies, we achieved >250W (clean burst power at I/F) during more than 10 Billion pulses of operation. At the conference, we will present the development progress of system key components of our EUV light source and the evaluation results of the rate of decrease in reflectivity of actual collector mirrors at >250W.

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Takahiro Tatsumi, Yoshifumi Ueno, Takayuki Yabu, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, and Hakaru Mizoguchi "Development progress update of the high power LPP-EUV light source using a magnetic field", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 1151717 (21 September 2020); https://doi.org/10.1117/12.2572689

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