Development of nanoimprint templates for dual damascene processing

Hisayoshi Watanabe; Takaharu Nagai; Koji Ichimura

doi:10.1117/12.2684687

29 September 2023 Development of nanoimprint templates for dual damascene processing

Hisayoshi Watanabe, Takaharu Nagai, Koji Ichimura

Author Affiliations +

Proceedings Volume 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; 1291504 (2023) https://doi.org/10.1117/12.2684687
Event: Photomask Japan 2023, 2023, Online Only

Abstract

Nanoimprint lithography, NIL, has been developed for fine feature pattern lithography for semiconductor fabrication as new generation lithography. NIL can realize finer and higher density of 2D patterns without design restriction. Additionally, NIL has potential of transferring 3D shapes if the template has 3D shapes. In this paper, we discussed the performance of our template for dual damascene processing. EB written master template quality targeting sub 20nm half pitch and template replication process of 3D shape was presented.

Citation Download Citation

Hisayoshi Watanabe, Takaharu Nagai, and Koji Ichimura "Development of nanoimprint templates for dual damascene processing", Proc. SPIE 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291504 (29 September 2023); https://doi.org/10.1117/12.2684687

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