Paper
15 February 1994 Basic improvements in the pellicle final clean area
Donald M. Shernock, James Campi, Hector I. Garcia, Alan Golob
Author Affiliations +
Abstract
In order to assure that only defect free masks will reach Hoya Micro Mask's customers we need clean water, an excellent cleaning system and, of course, the means to inspect the mask for lingering particles and to certify that the product is defect free within the customer's specifications. We have designed our own original method for checking the QC Optics API- 3000/5, for accuracy, precision and sensitivity by depositing a group of metallic points using our Seiko FIB and evenly spreading polystyrene spheres of various sizes over our test mask. The depositions provided a vehicle for determining the precision of the API-3000/5 and establishing defect placement. The polystyrene spheres determine the inspection system's accuracy and limits of detection. We have added to our cleaning capability by working together with Convac-APT in the design of a new state-of-the-art standalone cleaning system and have solved many of our water problems by introducing a custom designed point-of-use water treatment system.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Donald M. Shernock, James Campi, Hector I. Garcia, and Alan Golob "Basic improvements in the pellicle final clean area", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167260
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KEYWORDS
Optical spheres

Inspection

Photomask technology

Particles

Pellicles

Bacteria

Ozone

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