Paper
14 July 1999 Optical investigations of Cr and CrN layers obtained by magnetron sputtering in ion-beam-assisted deposition process (IBAD)
Waldemar Oleszkiewicz, Ewa Oleszkiewicz, Krystyna Zukowska
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Proceedings Volume 3820, 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics; (1999) https://doi.org/10.1117/12.353095
Event: Eleventh Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 1998, Stara Lesna, Slovakia
Abstract
In the ion beam deposition process the source of material was Cr target subjected to magnetron sputtering. Cr and CrN layers deposition processes were carried out in the presence of Ar and Ar + N2 ions atmosphere. The optical investigations of Cr and CrN layers obtained by IBAD processes were made to estimate the efficiency of such modifying factor as ion beam bombardment. The optical constants n and k were determined by ellipsometry for Cr and CrN layers deposited onto grounded or negatively biased (bias voltages from 0 to 500 V) BK7 glass substrates.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Waldemar Oleszkiewicz, Ewa Oleszkiewicz, and Krystyna Zukowska "Optical investigations of Cr and CrN layers obtained by magnetron sputtering in ion-beam-assisted deposition process (IBAD)", Proc. SPIE 3820, 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, (14 July 1999); https://doi.org/10.1117/12.353095
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Cited by 3 scholarly publications.
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KEYWORDS
Chromium

Sputter deposition

Ion beams

Deposition processes

Argon

Ions

Refractive index

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