Paper
22 October 2001 Laser technology of artworks and antiquities: fundamental aspects
Author Affiliations +
Proceedings Volume 4402, Laser Techniques and Systems in Art Conservation; (2001) https://doi.org/10.1117/12.445654
Event: Lasers in Metrology and Art Conservation, 2001, Munich, Germany
Abstract
In this paper, modeling of photochemical and photomechanical effects that may be induced during laser assisted cleaning of painted artworks using pulsed UV ablation is presented. The examined laser parameters are the wavelength at 248 nm and 193 nm in the nanosecond regime, and the fluence below and above the ablation threshold. The two polymeric substrate models used are PMMA and blends of PMMA and PS. A test case study is presented.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Costas Fotakis, Savas K. Georgiou, Vassilis Zafiropulos, and Vivi Tornari "Laser technology of artworks and antiquities: fundamental aspects", Proc. SPIE 4402, Laser Techniques and Systems in Art Conservation, (22 October 2001); https://doi.org/10.1117/12.445654
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Cited by 2 scholarly publications.
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KEYWORDS
Laser ablation

Polymers

Ultraviolet radiation

Polymethylmethacrylate

Luminescence

Holography

Laser applications

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