Modeling of chemical and mechanical aspects in laser restoration of artworks

Costas Fotakis; Athanassia Athanassiou; Efi Andreou; Vivi Tornari; Antonia Bonarou; Laura Antonucci; Dmitrios Anglos; Savas K. Georgiou; Vassilis Zafiropulos

doi:10.1117/12.456809

25 February 2002 Modeling of chemical and mechanical aspects in laser restoration of artworks

Costas Fotakis, Athanassia Athanassiou, Efi Andreou, Vivi Tornari, Antonia Bonarou, Laura Antonucci, Dmitrios Anglos, Savas K. Georgiou, Vassilis Zafiropulos

Author Affiliations +

Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456809
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore

Abstract

In this paper, investigation of photochemical and photomechanical effects induced in polymer substrates under pulsed UV ablation is presented. The examined laser parameters are the wavelength at 248 nm and 193 nm in the nanosecond regime, and the fluence below and above the ablation threshold. The two polymeric substrates used are PMMA and blends of PMMA and PS.

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Costas Fotakis, Athanassia Athanassiou, Efi Andreou, Vivi Tornari, Antonia Bonarou, Laura Antonucci, Dmitrios Anglos, Savas K. Georgiou, and Vassilis Zafiropulos "Modeling of chemical and mechanical aspects in laser restoration of artworks", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); https://doi.org/10.1117/12.456809

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