Real-world impacts of inverse lithography technology

Jonathan Ho; Yan Wang; Xin Wu; Wolfgang Leitermann; Benjamin Lin; Ming Feng Shieh; Jie-wei Sun; Orson Lin; Jason Lin; Yong Liu; Linyong Pang

doi:10.1117/12.632211

5 November 2005 Real-world impact of inverse lithography technology

Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Orson Lin, Jason Lin, Yong Liu, Linyong Pang

Author Affiliations +

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59921Z (2005) https://doi.org/10.1117/12.632211
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

In this paper we describe, from the user's point of view, how Inverse Lithography Technology (ILT) differs from Optical Proximity Correction (OPC). We show simulation and experimental results from 90nm and 65nm semiconductor nodes, comparing ILT-generated masks and OPC-generated masks for real-life layouts, in a production environment. In addition, we discuss issues related to complexity and manufacturability of ILT-generated masks.

Citation Download Citation

Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Orson Lin, Jason Lin, Yong Liu, and Linyong Pang "Real-world impact of inverse lithography technology", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921Z (5 November 2005); https://doi.org/10.1117/12.632211

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