Paper
27 May 2009 Residual-free imprint for sensor definition
A. Mayer, N. Bogdanski, S. Möllenbeck, H.-C. Scheer
Author Affiliations +
Proceedings Volume 7470, 25th European Mask and Lithography Conference; 74700K (2009) https://doi.org/10.1117/12.835182
Event: 25th European Mask and Lithography Conference, 2009, Dresden, Germany
Abstract
For the preparation of interdigitated sensor devices with nanometre sized electrodes a low-cost route is followed. The central technique used for electrode definition is nanoimprint. To imprint the larger contact areas as easy as the electrodes, the contacts are broken down into a grid. In order to end up with a highly uniform residual layer the concept of 'partial cavity filling' is utilised, resulting in an almost negligible layer thickness. The metallic electrodes are defined by sputtering and lift-off directly after imprint, where a previous etching of the residual layer is not required. The results show that the concept works. With this strategy, preparation of an interdigitated sensor requires nothing but spin-coating, nanoimprinting and sputtering/lift-off.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Mayer, N. Bogdanski, S. Möllenbeck, and H.-C. Scheer "Residual-free imprint for sensor definition", Proc. SPIE 7470, 25th European Mask and Lithography Conference, 74700K (27 May 2009); https://doi.org/10.1117/12.835182
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Electrodes

Sensors

Nanoimprint lithography

Etching

Metals

Sputter deposition

Silicon

RELATED CONTENT

ANSYS simulation of the microaccelerometer sensor
Proceedings of SPIE (March 15 2019)
Producibility of uncooled IRFPA detectors
Proceedings of SPIE (August 12 1992)
MMST development for HgCdTe FPA manufacture
Proceedings of SPIE (August 12 1992)
Study of 5 mask TFT array process with low cost...
Proceedings of SPIE (June 30 2000)

Back to Top