Paper
15 March 2016 Neon reduction program on Cymer ArF light sources
Dinesh Kanawade, Yzzer Roman, Ted Cacouris, Josh Thornes, Kevin O'Brien
Author Affiliations +
Abstract
In response to significant neon supply constraints, Cymer has responded with a multi-part plan to support its customers. Cymer’s primary objective is to ensure that reliable system performance is maintained while minimizing gas consumption. Gas algorithms were optimized to ensure stable performance across all operating conditions.

The Cymer neon support plan contains four elements: 1. Gas reduction program to reduce neon by >50% while maintaining existing performance levels and availability; 2. short-term containment solutions for immediate relief. 3. qualification of additional gas suppliers; and 4. long-term recycling/reclaim opportunity. The Cymer neon reduction program has shown excellent results as demonstrated through the comparison on standard gas use versus the new >50% reduced neon performance for ArF immersion light sources. Testing included stressful conditions such as repetition rate, duty cycle and energy target changes. No performance degradation has been observed over typical gas lives.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dinesh Kanawade, Yzzer Roman, Ted Cacouris, Josh Thornes, and Kevin O'Brien "Neon reduction program on Cymer ArF light sources", Proc. SPIE 9780, Optical Microlithography XXIX, 97801H (15 March 2016); https://doi.org/10.1117/12.2219942
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Neon

Light sources

Excimers

Deep ultraviolet

Lithography

Semiconductors

Fluorine

Back to Top