Dr. Akiyoshi Suzuki Profile

Dr. Akiyoshi Suzuki

at AS Lithography Consulting

SPIE Involvement:

Conference Program Committee | Author

Publications (30)

Proceedings Article | 2 April 2011 Paper

The comparison of NGLs from a tool vendor's view

Akiyoshi Suzuki

Proceedings Volume 7970, 797005 (2011) https://doi.org/10.1117/12.881274

KEYWORDS: Reticles, Nanoimprint lithography, Distortion, Extreme ultraviolet lithography, Double patterning technology, Photomasks, Semiconducting wafers, Projection systems, Wavefronts, Lithography

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Proceedings Article | 7 March 2008 Paper

Impact of optimization conditions on the result at optimizing illumination and mask

Koichiro Tsujita, Koji Mikami, Hiroyuki Ishii, Akiyoshi Suzuki

Proceedings Volume 6924, 69242U (2008) https://doi.org/10.1117/12.771369

KEYWORDS: Optical proximity correction, Polarization, Optical simulations, Scanners, Photomasks, Optimization (mathematics), Optical lithography, Nanoimprint lithography, Image quality, Computer simulations

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Proceedings Article | 26 March 2007 Paper

Illumination optimization with actual information of exposure tool and resist process

Koichiro Tsujita, Koji Mikami, Ryotaro Naka, Norikazu Baba, Tomomi Ono, Akiyoshi Suzuki

Proceedings Volume 6520, 652036 (2007) https://doi.org/10.1117/12.711048

KEYWORDS: Nanoimprint lithography, Optical proximity correction, Photomasks, Optical simulations, Optimization (mathematics), Electroluminescence, Photoresist processing, Polarization, Binary data, Calibration

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Proceedings Article | 12 July 2006 Paper

Catadioptric projection optical system for flat panel exposure tool

Michio Kohno, Kiyoshi Fukami, Hitoshi Yoshioka, Shu Watanabe, Akiyoshi Suzuki

Proceedings Volume 6342, 63420Y (2006) https://doi.org/10.1117/12.692265

KEYWORDS: Mirrors, Projection systems, Combined lens-mirror systems, Aspheric lenses, Photomasks, Optical alignment, Distortion, Wavefront aberrations, Iron, Monochromatic aberrations

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Proceedings Article | 17 September 2005 Paper

Comparisons between EUV at-wavelength metrological methods

Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5921, 59210D (2005) https://doi.org/10.1117/12.616676

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Metrology, Diffusion tensor imaging, Charge-coupled devices, EUV optics, Interferometers, Shearing interferometers, Diffraction

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Proceedings Article | 12 May 2005 Paper

Analysis of imaging properties for hyper-NA ArF immersion lithography

Yoshiyuki Sekine, Miyoko Kawashima, Kenji Yamazoe, Tokuyuki Honda, Akinori Ohkubo, Yasuhiro Kishikawa, Yuichi Iwasaki, Akiyoshi Suzuki

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600500

KEYWORDS: Photomasks, Projection systems, Refractive index, Water, Diffraction, Polarization, Immersion lithography, Critical dimension metrology, Microfluidics, Imaging systems

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Proceedings Article | 10 May 2005 Paper

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement

Zhiqiang Liu, Masashi Okada, Katsumi Sugisaki, Mikihiko Ishii, Yucong Zhu, Katsura Ohtaki, Jun Saito, Akiyoshi Suzuki, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Masahito Niibe, Katsuhiko Murakami

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599456

KEYWORDS: Diffraction, Diffraction gratings, Calibration, Shearing interferometers, Wavefronts, Light sources, Interferometers, Monochromatic aberrations, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 10 May 2005 Paper

Experimental comparison of absolute PDI and lateral shearing interferometer

Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqian Liu, Mikihiko Ishii, Jun Kawakami, Jun Saito, Katsuhiko Murakami, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Masahito Niibe

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600274

KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Extreme ultraviolet lithography, Extreme ultraviolet, Charge-coupled devices, Diffraction, Interferometers, Photomasks, Monochromatic aberrations

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV interferometry methods in EUVA project

Seima Kato, Chidane Ouchi, Masanobu Hasegawa, Akiyoshi Suzuki, Takayuki Hasegawa, Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600468

KEYWORDS: Wavefronts, Optical testing, Diffraction, Charge-coupled devices, Extreme ultraviolet, Monochromatic aberrations, Interferometers, Phase shifts, Calibration, Diffraction gratings

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Proceedings Article | 18 October 2004 Paper

Recent progress of EUV wavefront metrology in EUVA

Masanobu Hasegawa, Chidane Ouchi, Takayuki Hasegawa, Seima Kato, Akinori Ohkubo, Akiyoshi Suzuki, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.562431

KEYWORDS: Wavefronts, Extreme ultraviolet, Optical testing, Diffraction, Wavefront metrology, Interferometers, Shearing interferometers, Diffusion tensor imaging, Spherical lenses, Diffraction gratings

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Proceedings Article | 28 May 2004 Paper

ArF immersion lithography: critical optical issues

Tokuyuki Honda, Yasuhiro Kishikawa, Toshinobu Tokita, Hiroshi Ohsawa, Miyoko Kawashima, Akinori Ohkubo, Minoru Yoshii, Koji Uda, Akiyoshi Suzuki

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534024

KEYWORDS: Semiconducting wafers, Immersion lithography, Photomasks, Diffraction, Water, Liquids, Interferometry, Refractive index, Glasses, Lithography

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Proceedings Article | 20 May 2004 Paper

Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

Katsumi Sugisaki, Masanobu Hasegawa, Seima Kato, Chidane Ouchi, Jun Saito, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537344

KEYWORDS: Oxygen, Contamination, Tantalum, Extreme ultraviolet, Nickel, Gold, Carbon, Adsorption, Projection systems, Wavefronts

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Proceedings Article | 20 May 2004 Paper

EUV wavefront metrology system in EUVA

Takayuki Hasegawa, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Akiyoshi Suzuki, Katsumi Sugisaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536327

KEYWORDS: Extreme ultraviolet, Wavefronts, Monochromatic aberrations, Wavefront metrology, Photomasks, Metrology, Nickel, Synchrotron technology, Interferometers, Spherical lenses

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Proceedings Article | 20 May 2004 Paper

Lateral shearing interferometer for EUVL: theoretical analysis and experiment

Yucong Zhu, Katsumi Sugisaki, Chidane Ouchi, Masanobu Hasegawa, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537331

KEYWORDS: Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography, Shearing interferometers, Phase shifts, Diffraction gratings, Projection systems, Algorithm development, Diffraction, Extreme ultraviolet

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Proceedings Article | 14 November 2003 Paper

Precise in-situ transmission measurement system at 157 nm

Seiji Takeuchi, Yasuhiro Kishikawa, Minoru Yoshii, Akiyoshi Suzuki

Proceedings Volume 5192, (2003) https://doi.org/10.1117/12.506614

KEYWORDS: Beam splitters, Polarization, Transmittance, Sensors, Reflection, Calcium, Reflectivity, Lithography, Excimer lasers, Pulsed laser operation

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Proceedings Article | 16 June 2003 Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

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Proceedings Article | 1 August 2002 Paper

New resolution enhancement method realizing the limit of single mask exposure

Kenji Yamazoe, Masanobu Hasegawa, Kenji Saitoh, Akiyoshi Suzuki

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477002

KEYWORDS: Photomasks, Binary data, Optical lithography, Resolution enhancement technologies, Lithography, Printing, Semiconducting wafers, Projection systems, Double patterning technology

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Proceedings Article | 30 July 2002 Paper

Challenging the limit of single mask exposure

Kenji Yamazoe, Masanobu Hasegawa, Kenji Saitoh, Akiyoshi Suzuki

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474549

KEYWORDS: Photomasks, Binary data, Lithography, Lithographic illumination, Optical lithography, Printing, Resolution enhancement technologies, Double patterning technology, Scanners, Reticles

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SPIE Journal Paper | 1 April 2002

Analyses of imaging performance degradation caused by birefringence residual in lens materials

Yasuyuki Unno, Akiyoshi Suzuki

JM3, Vol. 1, Issue 01, (April 2002) https://doi.org/10.1117/12.10.1117/1.1434978

KEYWORDS: Birefringence, Wavefronts, Polarization, Modulation transfer functions, Image acquisition, Projection systems, Optical lithography, Fluorine, Optical components, Coherence imaging

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Proceedings Article | 14 September 2001 Paper

Analyses of imaging performance degradation caused by birefringence residual in lens materials

Yasuyuki Unno, Akiyoshi Suzuki

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435667

KEYWORDS: Birefringence, Wavefronts, Modulation transfer functions, Polarization, Image acquisition, Berkelium, Optical lithography, Coherence imaging, Projection systems, Transmittance

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Proceedings Article | 6 November 2000 Paper

Present status of excimer laser exposure apparatus

Akiyoshi Suzuki

Proceedings Volume 4088, (2000) https://doi.org/10.1117/12.405704

KEYWORDS: Optical lithography, Excimer lasers, Silica, Lithography, Projection systems, Absorption, Laser development, Chromatic aberrations, Optics manufacturing, Light sources

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Proceedings Article | 5 July 2000 Paper

193-nm step-and-scan lithography equipment

Naoto Sano, Kazuhiro Takahashi, Hitoshi Nakano, Akiyoshi Suzuki

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389041

KEYWORDS: Lithography, Scanners, Semiconducting wafers, Projection systems, Excimer lasers, Lithographic illumination, Distortion, Optical alignment, Laser development, Light sources

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Proceedings Article | 5 July 2000 Paper

Realization of very small aberration projection lenses

Toshiyuki Yoshihara, Ryo Koizumi, Kazuhiro Takahashi, Shigeyuki Suda, Akiyoshi Suzuki

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389045

KEYWORDS: Lenses, Wavefront aberrations, Manufacturing, Optics manufacturing, Monte Carlo methods, Lithography, Tolerancing, Chemical elements, Lens manufacturing, Optical components

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Proceedings Article | 5 July 2000 Paper

IDEAL double exposure method for polylevel structures

Carmelo Romeo, Paolo Canestrari, Antonio Fiorino, Masanobu Hasegawa, Kenji Saitoh, Akiyoshi Suzuki

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389013

KEYWORDS: Critical dimension metrology, Lithography, Photomasks, Optical lithography, Semiconducting wafers, Scanning electron microscopy, Reticles, Optical alignment, Phase shifting, Silicon

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Proceedings Article | 30 December 1999 Paper

Practical applications of IDEAL exposure method

Masanobu Hasegawa, Kenji Saitoh, Minoru Yoshii, Akiyoshi Suzuki

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373298

KEYWORDS: Photomasks, Double patterning technology, Lithography, Binary data, Logic devices, Scanning electron microscopy, Photography, Semiconducting wafers, Manufacturing, Optics manufacturing

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Proceedings Article | 25 August 1999 Paper

New approach for realizing k1=0.3 optical lithography

Masanobu Hasegawa, Akiyoshi Suzuki, Kenji Saito, Minoru Yoshii

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360235

KEYWORDS: Photomasks, Optical lithography, Logic devices, Lithography, Scanning electron microscopy, Photography, Resolution enhancement technologies, Double patterning technology, Semiconducting wafers, Binary data

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Proceedings Article | 26 July 1999 Paper

Multilevel imaging system realizing k1=0.3 lithography

Akiyoshi Suzuki, Kenji Saitoh, Minoru Yoshii

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354351

KEYWORDS: Lithography, Optical lithography, Logic devices, Photomasks, Scanning electron microscopy, Photography, Binary data, Imaging systems, Lithographic illumination

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Proceedings Article | 3 November 1994 Paper

Subresolution artifacts optimized for use with Canon's CQUEST illumination system, and their cost effective realization using the Lepton EBES4 e-beam reticle generator

Charles Biechler, C. Rose, David Walker, Akiyoshi Suzuki, Kazuhiro Takahashi

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191957

KEYWORDS: Reticles, X-ray technology, Leptons, Optics manufacturing, Photomasks, X-rays, Manufacturing, Raster graphics, Phase shifting, Printing

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Proceedings Article | 1 June 1992 Paper

Subhalf-micron lithography system with phase-shifting effect

Miyoko Noguchi, Masato Muraki, Yuichi Iwasaki, Akiyoshi Suzuki

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130312

KEYWORDS: Phase shifts, Lithography, Optical lithography, Photomasks, Photoresist materials, Manufacturing, Fourier transforms, Excimers, Optical components

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Proceedings Article | 1 June 1990 Paper

New alignment system for submicron stepper

Shunichi Uzawa, Akiyoshi Suzuki, Naoki Ayata

Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20058

KEYWORDS: Optical alignment, Image processing, Semiconducting wafers, Overlay metrology, Integrated circuits, Inspection, Process control, Digital signal processing, Reticles, Metrology

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Showing 5 of 30 publications

Proceedings Volume Editor (1)

SPIE Conference Volume | 10 May 2007

Photomask and Next-Generation Lithography Mask Technology XIV

Conference Committee Involvement (28)

International Conference on Extreme Ultraviolet Lithography 2025

21 September 2025 | Monterey, California, United States

Optical and EUV Nanolithography XXXVIII

24 February 2025 | San Jose, California, United States

International Conference on Extreme Ultraviolet Lithography 2024

30 September 2024 | Monterey, California, United States

Optical and EUV Nanolithography XXXVII

26 February 2024 | San Jose, California, United States

International Conference on Extreme Ultraviolet Lithography 2023

2 October 2023 | Monterey, California, United States

Optical and EUV Nanolithography XXXVI

27 February 2023 | San Jose, California, United States

International Conference on Extreme Ultraviolet Lithography 2022

26 September 2022 | Monterey, California, United States

Optical and EUV Nanolithography XXXV

25 April 2022 | San Jose, California, United States

International Conference on Extreme Ultraviolet Lithography 2021

27 September 2021 | Online Only, United States

Extreme Ultraviolet (EUV) Lithography XII

22 February 2021 | Online Only, California, United States

Extreme Ultraviolet (EUV) Lithography XI

24 February 2020 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography X

25 February 2019 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography IX

26 February 2018 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VIII

27 February 2017 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VII

22 February 2016 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VI

23 February 2015 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography V

24 February 2014 | San Jose, California, United States

Current Developments in Lens Design and Optical Engineering XI; and Advances in Thin Film Coatings VI

1 August 2010 | San Diego, California, United States

Current Developments in Lens Design and Optical Engineering X

4 August 2009 | San Diego, California, United States

Optical Microlithography XXI

26 February 2008 | San Jose, California, United States

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Optical Microlithography XX

27 February 2007 | San Jose, California, United States

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Optical Microlithography XIX

21 February 2006 | San Jose, California, United States

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Optical Microlithography XVIII

1 March 2005 | San Jose, California, United States

Optical Microlithography XVII

24 February 2004 | Santa Clara, California, United States

Optical Microlithography XVI

25 February 2003 | Santa Clara, California, United States

Showing 5 of 28 Conference Committees

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