Mr. Alfonso Sun Profile

Alfonso Sun

at ASML

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Publications (1)

Proceedings Article | 20 March 2020 Presentation + Paper

Process context based wafer level grouping control: an advanced overlay process correction designed for DRAM 1z nm node in high volume manufacturing

Linmiao Zhang, William Susanto, Katsumasa Takahashi, Albert Chen, Tim Tang, Yi Zou, Chenxi Lin, Simon Hastings, Samee Ur Rehman, Manouk Rijpstra, Alfonso Sun

Proceedings Volume 11325, 113251O (2020) https://doi.org/10.1117/12.2552823

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Feedback control, Optical parametric oscillators, Control systems, High volume manufacturing, Data processing, Metrology, Optical lithography

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