Dr. Andrea Leserri Profile

Dr. Andrea Leserri

at STMicroelectronics SRL

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Proceedings Article | 19 September 2018 Paper

CK-MASK semi-manual tool for mask inspection and blowing

Andrea Leserri, Francesco Ferrario, Umberto Iessi, Andrea Gusmini

Proceedings Volume 10775, 107750E (2018) https://doi.org/10.1117/12.2326607

KEYWORDS: Photomasks, Inspection, Particles, Pellicles, Contamination, Optical inspection, Lithography

Read Abstract +

Photolithography masks require a periodical inspection and cleaning. The visual inspection is often paired with a mask air blowing to remove eye visible particles. If these steps are run manually they are really critical for mask integrity in terms of contaminations, scratches, fingerprints, pellicle damage... All these potential issues arise during the mask certification process causing mask repelliculization, and, in the worst case, mask scrap with drawbacks linked to production aspects: quality (repetitive defects), cost (mask repels/remake), production lots on hold, non-linear production WIP and non-respect of production commitments. AG8-AGM photolithography engineering team in collaboration with “Gusmini attrezzature industriali” developed a tool called “CK-MASK” able to handle 6” masks and to reduce the risks connected to masks inspection and blowing.

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