Dr. Andrey Nikipelov Profile

Dr. Andrey Nikipelov

at ASML Netherlands BV

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Author

Publications (5)

Proceedings Article | 10 April 2024 Presentation + Paper

Particle mobilization by EUV-induced plasma and fast electrons

Mark van de Kerkhof, Dmitry Shefer, Andrey Nikipelov, Fabio Sbrizzai, Vladimir Kvon, Sim Bouwmans, Job Beckers, Vadim Banine

Proceedings Volume 12953, 129530E (2024) https://doi.org/10.1117/12.3009896

KEYWORDS: Particles, Plasma, Electrons, Adhesion, Scanners, Hydrogen, Extreme ultraviolet lithography, Ions, Stochastic processes, Particle contamination

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Proceedings Article | 5 March 2021 Presentation + Paper

Particle removal tool to repair particle defects on EUV reticles

Mark van de Kerkhof, Markus Waiblinger, Julia Weber, Christof Baur, Andrey Nikipelov, Christian Cloin

Proceedings Volume 11609, 116090N (2021) https://doi.org/10.1117/12.2583981

KEYWORDS: Particles, Reticles, Extreme ultraviolet, Tin, X-rays, Statistical analysis, Scanning electron microscopy, Scanners, Photomasks, Pellicles

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Morphology change and release of tin and lead micro-particles from substrates in hydrogen plasma

Dmitry Shefer, Andrey Nikipelov, Mark van de Kerkhof, Vadim Banine, Job Beckers

Proceedings Volume 11609, 116091F (2021) https://doi.org/10.1117/12.2581666

KEYWORDS: Plasma, Particles, Hydrogen, Tin, Lead, Extreme ultraviolet lithography, Ions, Semiconducting wafers, Reticles, Extreme ultraviolet

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Proceedings Article | 23 March 2020 Paper

Understanding EUV-induced plasma and application to particle contamination control in EUV scanners

Mark van de Kerkhof, Andrei Yakunin, Vladimir Kvon, Ferdi van de Wetering, Selwyn Cats, Luuk Heijmans, Andrey Nikipelov, Adam Lassise, Vadim Banine

Proceedings Volume 11323, 113230Y (2020) https://doi.org/10.1117/12.2551020

KEYWORDS: Plasma, Particles, Ions, Extreme ultraviolet, Scanners, Hydrogen, Reticles, Particle contamination

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Proceedings Article | 26 March 2019 Presentation + Paper

Advanced particle contamination control in EUV scanners

Mark van de Kerkhof, Tjarko van Empel, Michael Lercel, Christophe Smeets, Ferdi van de Wetering, Andrey Nikipelov, Christian Cloin, Andrei Yakunin, Vadim Banine

Proceedings Volume 10957, 109570U (2019) https://doi.org/10.1117/12.2514874

KEYWORDS: Particles, Reticles, Scanners, Pellicles, Plasma, Extreme ultraviolet, Particle contamination

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