Mr. Bert van der Pasch Profile

Bert van der Pasch

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 16 March 2009 Paper

Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system

Fred de Jong, Bert van der Pasch, Tom Castenmiller, Bert Vleeming, Richard Droste, Frank van de Mast

Proceedings Volume 7274, 72741S (2009) https://doi.org/10.1117/12.814254

KEYWORDS: Semiconducting wafers, Computer programming, Lithography, Interferometers, Optical alignment, Time metrology, Overlay metrology, Metrology, Reticles, Refractive index

Read Abstract +

The lithography roadmap demands overlay reduction along with increased productivity. New applications are proposed as lithography solution for the 32-nm node and possibly beyond. Most of them require very tight overlay and multiple exposures. Major contributors in the overlay budget are coming from the exposure system, like thermal stability, lens aberrations stability, stage positioning and alignment. An additional complexity is the interaction with the actual process and the pattern on the reticle. To keep the lithography roadmap affordable, the cost per wafer needs to be tamed by boosting the productivity of the exposure tool. To enable new applications in a production environment a new generation lithographic exposure tools was developed, with improved overlay and increased productivity. The optical column contains an improved 1.35 NA immersion lens. Compared to the former generation the combination of overlay and productivity requirements are met by a high acceleration wafer stage along with a new stage position measurement system, introducing new technologies paving the way to meet the future roadmap requirements. The increased disturbances caused by the higher accelerations are countered by a short-beam interferometer system thus ensuring optimal positioning performance. Further productivity enhancements are reached by reducing non-exposure time. The latest performance results will be presented; this will include overlay results as well as other critical system performance data.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years