Mr. Booky Lee Profile

Booky Lee

Deputy Plant Manager at Tekscend Photomask Chunghwa Inc.

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Author

Publications (8)

Proceedings Article | 15 May 2007 Paper

The effect between absorber profile and wafer print process window in ArF 6% Att. PSM mask

Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei

Proceedings Volume 6607, 660736 (2007) https://doi.org/10.1117/12.729025

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Critical dimension metrology, Scanners, Wafer-level optics, Manufacturing, Lutetium, Microelectronics

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Proceedings Article | 20 October 2006 Paper

The effect between mask blank flatness and wafer print process window in ArF 6% att. PSM mask

Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei

Proceedings Volume 6349, 634954 (2006) https://doi.org/10.1117/12.692881

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Chromium, Printing, 193nm lithography, Quartz, Polishing, Lutetium, Microelectronics

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Proceedings Article | 20 May 2006 Paper

Advanced hybrid mask process development

Orson Lin, Jomarch Chou, K. K. Fu, Booky Lee, Richard Lu, Jerry Lu, Chiang-Lin Shi

Proceedings Volume 6283, 62831S (2006) https://doi.org/10.1117/12.681754

KEYWORDS: Etching, Photomasks, Chromium, Resolution enhancement technologies, Neodymium, Quartz, Image processing, Diffractive optical elements, Phase shifts, Binary data

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Proceedings Article | 21 March 2006 Paper

Inverse lithography technology at chip scale

Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Orson Lin, Jason Lin, Yong Liu, Linyong Pang

Proceedings Volume 6154, 615414 (2006) https://doi.org/10.1117/12.656827

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Manufacturing, Scanning electron microscopy, Calibration, Image quality, Semiconducting wafers, Image processing, Semiconductors

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Proceedings Article | 8 November 2005 Paper

Advanced e-beam CAR resist evaluation for 65nm generation

Gordon Chan, Orson Lin, Wesen Tseng, Booky Lee, Torey Huang, Makoto Kozuma

Proceedings Volume 5992, 59923B (2005) https://doi.org/10.1117/12.632052

KEYWORDS: Critical dimension metrology, Photomasks, Line edge roughness, Photoresist processing, Etching, Manufacturing, Edge roughness, Chemically amplified resists, Tin, Electronics

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Proceedings Article | 28 June 2005 Paper

Application of CPL mask for whole chip 65nm DRAM patterning

Orson Lin, Richard Hung, Booky Lee, Yuan-Hsun Wu, Makoto Kozuma, Chiang-Lin Shih, Jengping Lin, Michael Hsu, Stephen Hsu

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617230

KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Manufacturing, Resolution enhancement technologies, Etching, Data modeling, Quartz, Chromium, Coating

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Proceedings Article | 27 January 2005 Paper

Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology

Booky Lee, Richard Hung, Orson Lin, Yuan-Hsun Wu, Makoto Kozuma, Chiang-Lin Shih, Michael Hsu, Stephen Hsu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.576542

KEYWORDS: Photomasks, Etching, Neodymium, Coating, Quartz, Chromium, Optical alignment, Scanning electron microscopy, Contamination, Image processing

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Proceedings Article | 6 December 2004 Paper

Reduce process bias of photomask manufacturing for next-generation lithography

Booky Lee, Sharon Wang, Toroy Tian, Samuel Yang, Roy Chen

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569238

KEYWORDS: Etching, Chromium, Photomasks, Reactive ion etching, Diffractive optical elements, Manufacturing, Photoresist processing, Plasma etching, Lithography, Plasma

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Showing 5 of 8 publications

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