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Dr. Bruno Langbehn
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Publications (1)
Proceedings Article | 22 November 2023 Presentation
ZEISS AIMS EUV high-NA for actinic mask review for the next EUV scanner generation
Klaus Gwosch, Renzo Capelli, Matthias Roesch, Robert Nicholls, Bruno Langbehn, Michael Mohn, Andreas Verch, Maximilian Albert, Grizelda Kersteen, Alexander Winkler, Carolin Müller, Sven Krannich
Proceedings Volume PC12750, PC127500O (2023) https://doi.org/10.1117/12.2687495
KEYWORDS: Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Imaging systems, Semiconducting wafers, Printing, Photomasks, Metrology, Lithography, Light sources and illumination
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