Dr. Changyoung Jeong Profile

Dr. Changyoung Jeong

at SAMSUNG Electronics Co Ltd

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Author

Publications (6)

Proceedings Article | 12 November 2024 Presentation + Paper

Requirements and strategies of High-NA EUV mask using MBMW

Yoonjung Cho, Inhwan Noh, Jongmun Park, Byungsup Ahn, Hongsu Kim, Minji Kim, Yuri Kim, Ueba Ryosuke, Changyoung Jeong, Jin Choi, Sang-Hee Lee

Proceedings Volume 13216, 132160E (2024) https://doi.org/10.1117/12.3034574

KEYWORDS: Extreme ultraviolet, Photomasks, Lithography, Optical lithography, Extreme ultraviolet lithography, Line edge roughness, Electron beam lithography, 3D mask effects

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Proceedings Article | 25 March 2019 Presentation + Paper

Multiscale approach for modeling EUV patterning of chemically amplified resist

Hyungwoo Lee, Muyoung Kim, Junghwan Moon, Sungwoo Park, Byunghoon Lee, Changyoung Jeong, Maenghyo Cho

Proceedings Volume 10960, 1096008 (2019) https://doi.org/10.1117/12.2514840

KEYWORDS: Diffusion, Polymers, Chemical reactions, Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Chemically amplified resists, Photoresist materials, Optical lithography

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Proceedings Article | 19 March 2018 Paper

Theoretical modeling of PEB procedure on EUV resist using FDM formulation

Muyoung Kim, Junghwan Moon, Joonmyung Choi, Byunghoon Lee, Changyoung Jeong, Heebom Kim, Maenghyo Cho

Proceedings Volume 10583, 1058323 (2018) https://doi.org/10.1117/12.2296494

KEYWORDS: Diffusion, Polymers, Chemical reactions, Extreme ultraviolet lithography, Photoresist materials, Line edge roughness, Electrons, Molecules, Finite difference methods

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Proceedings Article | 24 March 2017 Paper

Computational approach on PEB process in EUV resist: multi-scale simulation

Muyoung Kim, Junghwan Moon, Joonmyung Choi, Byunghoon Lee, Changyoung Jeong, Heebom Kim, Maenghyo Cho

Proceedings Volume 10143, 101432E (2017) https://doi.org/10.1117/12.2266540

KEYWORDS: Extreme ultraviolet lithography, Computer simulations, Photoresist processing, Line edge roughness, Chemical reactions, Photoresist materials, Photochemistry, Semiconductors, Photoresist developing, Diffusion, Molecules, Electrons, Polymers, Monte Carlo methods

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Proceedings Article | 23 March 2012 Paper

Printability study of pattern defects in the EUV mask as a function of hp nodes

Tae-Geun Kim, Hwan-Seok Seo, In-Yong Kang, Chang Young Jeong, Sungmin Huh, Jihoon Na, Seong-Sue Kim, Chan-Uk Jeon, Iacopo Mochi, Kenneth Goldberg

Proceedings Volume 8322, 83220A (2012) https://doi.org/10.1117/12.916052

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Scanning electron microscopy, Scanners, Lithography, Photoresist processing, Semiconductors

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Proceedings Article | 23 March 2012 Paper

Printability and inspectability of defects on EUV blank for 2xnm hp HVM application

Sungmin Huh, In-Yong Kang, Chang Young Jeong, Jihoon Na, Dong Ryul Lee, Hwan-seok Seo, Seong-Sue Kim, Chan-Uk Jeon, Jonggul Doh, Gregg Inderhees, Jinho Ahn

Proceedings Volume 8322, 83220K (2012) https://doi.org/10.1117/12.916021

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Bismuth, Defect inspection, High volume manufacturing, Defect detection, Semiconductors

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Showing 5 of 6 publications

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