Dr. Charles J. Neef
Scientist at Brewer Science Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 1 April 2009 Paper
Charles Neef, Brian Smith, Chris James, Zhimin Zhu, Michael Weigand
Proceedings Volume 7273, 727311 (2009) https://doi.org/10.1117/12.814257
KEYWORDS: Carbon, Silicon, Silicon carbide, Etching, Photoresist materials, Lithography, Silicon films, Semiconducting wafers, Chemistry, Epoxies

Proceedings Article | 26 March 2008 Paper
Charles Neef, Jim Finazzo, Cheryl Nesbit, Michael Weigand
Proceedings Volume 6923, 692331 (2008) https://doi.org/10.1117/12.771701
KEYWORDS: Etching, Silicon, Photoresist materials, Semiconducting wafers, Temperature metrology, Titanium, Chemistry, Lithography, Crystals, Carbon

Proceedings Article | 2 April 2007 Paper
Proceedings Volume 6519, 65192S (2007) https://doi.org/10.1117/12.712342
KEYWORDS: Reflectivity, Silicon, Lithography, System on a chip, Etching, Multilayers, Photomasks, Semiconducting wafers, Plasma etching, Plasma

Proceedings Article | 30 March 2007 Paper
Charles Neef, Debra Thomas
Proceedings Volume 6519, 65192Z (2007) https://doi.org/10.1117/12.712459
KEYWORDS: Lithography, Semiconducting wafers, Reflectivity, Silicon, Chromophores, Argon, Temperature metrology, Photoresist materials, Critical dimension metrology, Photoresist developing

Proceedings Article | 14 May 2004 Paper
Charles Neef, Vandana Krishnamurthy, Mariya Nagatkina, Evan Bryant, Michelle Windsor, Cheryl Nesbit
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535423
KEYWORDS: Reflectivity, Photoresist materials, Silicon, Lithography, Etching, Semiconducting wafers, Optical lithography, Photoresist developing, Bottom antireflective coatings, Resistance

Showing 5 of 8 publications
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