Proceedings Article | 1 October 2024
KEYWORDS: Waveguides, Zinc oxide, Atomic layer deposition, Aluminum, Optical resonators, Design, Tunable filters, Silicon, Refractive index, Evanescence
In the realm of thin film fabrication, Atomic Layer Deposition (ALD) is a versatile technique that facilitates the growth of high-quality and precision films for various applications, such as micro-electronics focused on chips. ALD-deposited materials on an insulator platform can expand their potential to include optics and photonics. This study introduces the design and numerical simulation of integrated optics all-pass microring resonators (AOR) cavities. These designs are based on the measured optical characteristics of materials deposited via ALD, specifically aluminum, titanium, and zinc oxides, recognized as transparent materials on Si/SiO2 (insulator) platforms. This platform is based on a channel waveguide from a subwavelength cross-section dimension selected to propagate fundamental modes, considering a suitable cross-section scale, good modal confinement, and optimal deep evanescent wave distance. In addition, the following parameters were discussed to propose an optimal AOR configuration: distance gap, high transmission, extinction ratio, resonant wavelength, full-width half maximum, free spectral range, finesse, quality factor, propagation losses, and ring radius. In optical communication applications focused in the telecommunication window (1.55μm), for its excellent fundamental mode confinement, with an evanescent decay of 855μm, a quality factor reaching up to 104, the zinc oxide on an insulator (ZOI) was the best configuration. The outcomes suggest that employing atomic layer deposition to synthesis of core materials on an insulator presents a viable alternative platform for optics and photonics devices.
