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Emma Porcheron
at CEA-LETI
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Publications (1)
Proceedings Article | 13 June 2022 Poster
Intra track backside cleaning optimization to reduce the focus spot in Immersion lithography cluster
Nathalie Frolet, Emma Porcheron, Karine Jullian, Michael May, Yuji Tanaka, Masahiko Harumoto, Raluca Tiron
Proceedings Volume PC12055, PC120550M (2022) https://doi.org/10.1117/12.2614242
KEYWORDS: Immersion lithography, Semiconducting wafers, Scanners, Plasma etching, Contamination, Scanning electron microscopy, Polymers, Polishing, Plasma, Inspection
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