Dr. Franck Robin Profile

Dr. Franck Robin

at ETH Zürich

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 29 August 2008 Paper

The impact of metallic contacts on propagation losses of an underlying photonic crystal waveguide

Peter Kaspar, Roman Kappeler, Fouad Karouta, Franck Robin, Patric Strasser, Heinz Jäckel

Proceedings Volume 7031, 70310A (2008) https://doi.org/10.1117/12.793687

KEYWORDS: Waveguides, Metals, Photonic crystals, Cladding, Wave propagation, Finite-difference time-domain method, Refractive index, Optics manufacturing, Fabry–Perot interferometers, Active optics

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Proceedings Article | 20 April 2006 Paper

A multiple regrowth process for monolithically integrated InP-based mode-locked laser diodes with uni-travelling carrier absorber

Hans-Jörg Lohe, Riccardo Scollo, Werner Vogt, Emilio Gini, Franck Robin, Daniel Erni, Rik Harbers, Heinz Jäckel

Proceedings Volume 6183, 61831K (2006) https://doi.org/10.1117/12.662412

KEYWORDS: Interfaces, Photomasks, Waveguides, Mode locking, Semiconductor lasers, Zinc, Picosecond phenomena, Etching, Quantum wells, Semiconducting wafers

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Progress in photonics by monolithic integration for higher functional density, performance and reduced cost faces challenging hurdles due to technological and functional heterogeneities. Advanced local material growth techniques are enabling concepts towards high-density photonic integration, unprecedented performance and multi-functionality and ultimately optical systems-on-a-chip. For example mode-locked laser diodes (MLLDs) are key devices for ultra-short pulse generation for all-optical Tbit/s communication networks. MLLDs suffer from material compromises and will benefit from the possibility to design the gain, absorber and passive-waveguiding sections independently. We have proposed and demonstrated the integration of a saturable absorber with a fast absorption recovery time based on an InP/InGaAsP uni-traveling-carrier structure (UTC) to achieve pulses below 1 ps with repetition rates up to 40 GHz. The use of the UTC absorber instead of the commonly employed reverse-biased gain material requires however the heterogeneous growth of multiple layer stacks on the same chip with the butt-coupled regrowth technique.Critical for the MLLD performance are the reflections and the optical coupling between the different monolithic integrated layer structures of passive, absorbing and amplifying sections. 2D FDTD simulations of the optical waveguides demonstrate that to minimize reflections an angled interface between the different structures is preferable and can lead to reflection coefficients as low as 10^-6. To obtain an angled interface we used a wet chemical etching process sequence of selective and non-selective etchants, which is sensitive to crystal orientation and yields a 55° tilted interface. In addition we can conclude from our simulations that in order to minimize both, insertion loss and reflections, a bending of the light guiding layers has to be prevented. Bendings can lead to measured losses of 5-7 dB per interface whereas correctly aligned light guiding layers results in losses of 1.5 dB and intensity reflections below 10^-5 per interface. The bendings originate from different growth rates near and far away from masked areas during regrowth due to reactants diffusion on the SiO2 mask. The bending can be minimized by optimizing the mask under etch of the SiO2 mask and low pressure MOVPE growth. We demonstrate operation of mode-locked laser diodes with an integrated UTC absorber and pulse durations below 1 ps.

Proceedings Article | 14 April 2006 Paper

Characterization of an ultrafast uni-traveling-carrier absorber for monolithically integrated InGaAsP/InP mode-locked laser diodes

Riccardo Scollo, Hans-Jörg Lohe, Franck Robin, Daniel Erni, Emilio Gini, Werner Vogt, Heinz Jäckel

Proceedings Volume 6184, 61841G (2006) https://doi.org/10.1117/12.662402

KEYWORDS: Absorption, Mode locking, Waveguides, Semiconductor lasers, Optical amplifiers, Electrons, Ultrafast phenomena, Amplifiers, Picosecond phenomena, Cladding

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Proceedings Article | 3 March 2006 Paper

Photonic integration for high-density and multifunctionality in the InP-material system

F. Robin, D. Erni, S. Costea, P. Cristea, X. Cui, Y. Fedoryshyn, E. Gini, C. Hafner, R. Harbers, J. Holzman, H.-J. Lohe, P. Ma, K. Rauscher, R. Scollo, G. Stark, P. Strasser, W. Vogt, R. Wüest, H. Jäckel

Proceedings Volume 6124, 612415 (2006) https://doi.org/10.1117/12.652109

KEYWORDS: Waveguides, Photonic crystals, Interfaces, 3D modeling, Etching, Mode locking, Cladding, Photomasks, Integrated optics, Quantum wells

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Proceedings Article | 7 July 2005 Paper

Near-field optical microscopy of light propagation through photonic crystal waveguide tapers

R. Wuest, Benjamin Buchler, Rik Harbers, Patric Strasser, K. Rauscher, F. Robin, Daniel Erni, Vahid Sandoghdar, H. Jackel

Proceedings Volume 5840, (2005) https://doi.org/10.1117/12.608252

KEYWORDS: Waveguides, Near field scanning optical microscopy, Photonic crystals, Light scattering, Near field, Dispersion, Optical microscopy, Scattering, Light wave propagation, 3D metrology

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SPIE Journal Paper | 1 April 2005

Limitations of proximity-effect corrections for electron-beam patterning of planar photonic crystals

Robert Wüest, Franck Robin, Christoph Hunziker, Patric Strasser, Daniel Erni, Heinz Jäckel

OE, Vol. 44, Issue 04, 043401, (April 2005) https://doi.org/10.1117/12.10.1117/1.1883239

KEYWORDS: Optical lithography, Photonic crystals, Backscatter, Lithography, Optical engineering, Optical simulations, Electron beam lithography, Computer simulations, Photomicroscopy, Statistical analysis

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Proceedings Article | 25 October 2004 Paper

Realistic two-dimensional models for planar photonic crystal devices

Katharina Rauscher, Jan-Robert van Look, Rik Harbers, Daniel Erni, Patric Strasser, Robert Wueest, Franck Robin, Werner Baechtold

Proceedings Volume 5597, (2004) https://doi.org/10.1117/12.570185

KEYWORDS: Waveguides, 3D modeling, Finite-difference time-domain method, 3D metrology, Scattering, Photonic crystals, Solids, Photonic crystal devices, Instrument modeling, Etching

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Proceedings Article | 25 March 2004 Paper

Limitations of proximity-effect correction for electron-beam patterning of photonic crystals

Robert Wuest, Christoph Hunziker, Franck Robin, Patric Strasser, Daniel Erni, Heinz Jackel

Proceedings Volume 5277, (2004) https://doi.org/10.1117/12.522316

KEYWORDS: Photonic crystals, Optical lithography, Lithography, Backscatter, Electron beam lithography, Photomicroscopy, Computer simulations, Statistical analysis, Optical simulations, Modulation

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Showing 5 of 8 publications

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