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Gloria Yeh
at Nanya Technology Corp
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Publications (1)
Proceedings Article | 12 November 2024 Presentation + Paper
Assessing need and methodology for mask constraints in ILT applications
Mohamed Ramadan, Chris Progler, Henry Kamberian, Jinju Beineke, Michael Green, Guangming Xiao, Ming-Feng Shen, Kai-Hsiang Chang, Kyle Braam, Alex Zepka, Yu-Po Tang, Szu Ping Chen, Eric Huang, Gloria Yeh, Nicole Wu, Chun-Cheng Liao
Proceedings Volume 13216, 132161Q (2024) https://doi.org/10.1117/12.3042434
KEYWORDS: Semiconducting wafers, Printing, Vestigial sideband modulation, Photoresist processing, Simulations, Design rules, Chip manufacturing, SRAF, Optical proximity correction, Lithography
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