Dr. Guillaume Freychet
Beamline Scientist at CEA
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 1295535 (2024) https://doi.org/10.1117/12.3010744
KEYWORDS: Overlay metrology, Scanning electron microscopy, Contour extraction, Scanning transmission electron microscopy, Semiconducting wafers, Scattering, X-rays, Silicon, Image restoration, Critical dimension metrology

SPIE Journal Paper | 8 March 2024
Timothée Choisnet, Abdelali Hammouti, Vincent Gagneur, Jérôme Reche, Guido Rademaker, Guillaume Freychet, Guillaume Jullien, Julien Ducoté, Patrice Gergaud, Delphine Le Cunff
JM3, Vol. 23, Issue 01, 014002, (March 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.014002
KEYWORDS: Critical dimension metrology, Transmission electron microscopy, Cadmium, X-rays, Synchrotrons, Silicon, Semiconducting wafers, Lithography, Scanning electron microscopy, Chromium

SPIE Journal Paper | 24 June 2023
JM3, Vol. 22, Issue 03, 031210, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.031210
KEYWORDS: X-rays, X-ray sources, Scattering, Grazing incidence, Silicon, Reflection, Laser scattering, Atomic force microscopy, X-ray microscopy, X-ray technology

Proceedings Article | 27 April 2023 Presentation + Paper
Timothée Choisnet, Abdelali Hammouti, Vincent Gagneur, Jérôme Reche, Guido Rademaker, Guillaume Freychet, Guillaume Jullien, Julien Ducote, Patrice Gergaud, Delphine Le Cunff
Proceedings Volume 12496, 124961K (2023) https://doi.org/10.1117/12.2657661
KEYWORDS: Transmission electron microscopy, Synchrotrons, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Cadmium, X-rays, Scattering, Lithography, Silicon

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124961L (2023) https://doi.org/10.1117/12.2657500
KEYWORDS: X-rays, Scattering, X-ray sources, Grazing incidence, Silicon, Reflection, Metrology, Atomic force microscopy, Genetic algorithms, Signal intensity

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11612, 116120A (2021) https://doi.org/10.1117/12.2583908
KEYWORDS: Etching, Oxides, Metals, Extreme ultraviolet, Resistance, Optical lithography, Silicon, Scanning transmission electron microscopy, Plasma etching, Nanolithography

Proceedings Article | 24 March 2020 Presentation
Guillaume Freychet, Dinesh Kumar, Isvar Cordova, Ron Pandolfi, Patrick Naulleau, Cheng Wang, Alex Hexemer
Proceedings Volume 11325, 113251A (2020) https://doi.org/10.1117/12.2552155

Proceedings Article | 24 March 2020 Presentation
Isvar Cordova, Luke Long, Guillaume Freychet, Cheng Wang, P. Naulleau
Proceedings Volume 11323, 113231P (2020) https://doi.org/10.1117/12.2552178

Proceedings Article | 16 October 2019 Presentation
Isvar Cordova, Guillaume Freychet, Luke Long, Scott Dhuey, Cheng Wang, Patrick Naulleau
Proceedings Volume 11147, 111470Y (2019) https://doi.org/10.1117/12.2539040
KEYWORDS: Line edge roughness, X-ray imaging, X-rays, Lithography, Scattering, Extreme ultraviolet, Photodetectors, Grazing incidence, Carbon, Chemistry

SPIE Journal Paper | 3 May 2019 Open Access
Guillaume Freychet, Isvar Cordova, Terry McAfee, Dinesh Kumar, Ronald Pandolfi, Chris Anderson, Scott Dhuey, Patrick Naulleau, Cheng Wang, Alexander Hexemer
JM3, Vol. 18, Issue 02, 024003, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.024003
KEYWORDS: Scattering, X-rays, 3D image reconstruction, Extreme ultraviolet, X-ray imaging, Extreme ultraviolet lithography, 3D image processing, Modulation, Carbon, Image enhancement

Proceedings Article | 26 March 2019 Presentation
Guillaume Freychet, Dinesh Kumar, Ron Pandolfi, Isvar Cordova, Patrick Naulleau, Alexander Hexemer, Gian Lorusso
Proceedings Volume 10959, 109590R (2019) https://doi.org/10.1117/12.2514954
KEYWORDS: X-rays, Line edge roughness, Scattering, Data modeling, Data acquisition, Line width roughness, Manufacturing, Nanostructures, Scanning electron microscopy, Electron microscopes

Proceedings Article | 26 March 2019 Presentation
Isvar Cordova, Guillaume Freychet, Scott Dhuey, Alexander Hexemer, Patrick Naulleau, Cheng Wang
Proceedings Volume 10959, 109590K (2019) https://doi.org/10.1117/12.2515166
KEYWORDS: Scattering, X-ray imaging, X-rays, Laser scattering, Electron beam lithography, Image processing, Line edge roughness, 3D image processing, Lithography, Photoresist processing

Proceedings Article | 9 October 2018 Presentation + Paper
Guillaume Freychet, Isvar Cordova, Terry McAfee, Dinesh Kumar, Ronald Pandolfi, Chris Anderson, Patrick Naulleau, Cheng Wang, Alexander Hexemer
Proceedings Volume 10809, 108090V (2018) https://doi.org/10.1117/12.2502769
KEYWORDS: Scattering, X-rays, Extreme ultraviolet lithography, Modulation, Extreme ultraviolet, Carbon, X-ray imaging, Absorption, 3D image reconstruction, Laser scattering

SPIE Journal Paper | 31 July 2018
Jérôme Reche, Maxime Besacier, Patrice Gergaud, Yoann Blancquaert, Guillaume Freychet, Thibault Labbaye
JM3, Vol. 17, Issue 04, 041005, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041005
KEYWORDS: Metrology, Line width roughness, Critical dimension metrology, Sensors, X-rays, Scanning electron microscopy, Reflectivity, Scattering, Reliability, Manufacturing

Proceedings Article | 19 March 2018 Presentation
Proceedings Volume 10586, 105860X (2018) https://doi.org/10.1117/12.2297480
KEYWORDS: Scattering, X-rays, Directed self assembly, Integrated circuits, Optical lithography, Etching, 3D acquisition, 3D modeling

Proceedings Article | 13 March 2018 Presentation + Paper
G. Freychet, D. Kumar, R. Pandolfi, D. Staacks, P. Naulleau, R. J. Kline, D. Sunday , M. Fukuto, J. Strzalka, A. Hexemer
Proceedings Volume 10585, 1058512 (2018) https://doi.org/10.1117/12.2297518
KEYWORDS: X-rays, Scattering, Metrology, Grazing incidence, Nanostructures, Genetic algorithms

Proceedings Article | 13 March 2018 Presentation + Paper
Jérôme Reche, Maxime Besacier, Patrice Gergaud, Yoann Blancquaert, Guillaume Freychet, Thibault Labbaye
Proceedings Volume 10585, 105850F (2018) https://doi.org/10.1117/12.2292169
KEYWORDS: Line width roughness, Metrology, Critical dimension metrology, Reflectivity, Reliability, Scanning electron microscopy, Manufacturing, X-rays, Microelectronics

Proceedings Article | 8 March 2016 Paper
G. Freychet, C. Cadoux, Y. Blancquaert, S. Rey, M. Maret, P. Gergaud
Proceedings Volume 9778, 97783V (2016) https://doi.org/10.1117/12.2235102
KEYWORDS: Line edge roughness, Line width roughness, Scattering, X-rays, Scanning electron microscopy, Satellites, Optical lithography, Metrology, Lithography, Silicon

Showing 5 of 18 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top