Mr. Jae Hyoung Kim Profile

Jae Hyoung Kim

at SAMSUNG Electronics Co Ltd

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Author

Publications (3)

Proceedings Article | 17 December 2024 Presentation + Paper

Sub-3nm gate-all-around process incoming control and application of advanced EUV overlay strategy enhancing productivity

SungWoon Uh, Dongmin Kim, Dooho Park, Sangil Son, JaeHyung Kim, InSung Kim

Proceedings Volume PC12953, PC129530N (2024) https://doi.org/10.1117/12.3010035

KEYWORDS: Semiconducting wafers, Overlay metrology, Surface roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Process control, Lithography, Deformation, Optical alignment, Chemical vapor deposition

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Proceedings Article | 10 April 2024 Presentation + Paper

Improving EUV sub-40nm via single patterning using wavefront and pupil co-optimization

Soojung Kim, No Young Chung, Kwangseok Maeng, Hyunjae Cho, Jerry Lim, Hyungrok Jang, Jae Hyoung Kim, Insung Kim, Eelco van Setten, Hidde Keizers, Ajinkya Patil, Steven Beekmans, Jungtae Lee, Ki-Seok Kim, James Lee, Sung-Woon Park, Jialei Tang, Stephen Hsu, Youping Zhang, Paul Derks

Proceedings Volume 12953, 1295306 (2024) https://doi.org/10.1117/12.3009878

KEYWORDS: Wavefronts, Extreme ultraviolet, Extreme ultraviolet lithography, Light sources and illumination, Stochastic processes, Diffraction, Optical lithography, Source mask optimization, Projection systems

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Proceedings Article | 10 April 2024 Poster + Paper

Diffraction-based metrology for dose monitoring and control

Young Sung Kim, JongHyun Lee, SangHyun Lee, Kwangseok Maeng, JaeHyoung Kim, InSung Kim, SungWoon Uh, Eric Janda, Ajinkya Patil, SuYeun Baek, SeongYong Cho, James Lee

Proceedings Volume 12955, 129553E (2024) https://doi.org/10.1117/12.3010991

KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Diffraction, Scanners, Dose control, Design, Wafer level optics, Optical sensing, Diffraction gratings

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