Dr. Jeehong Yang Profile

Dr. Jeehong Yang

at Qualcomm Inc

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Author

Publications (6)

SPIE Journal Paper | 9 September 2013 Open Access

Datapath system for multiple electron beam lithography systems using image compression

Jeehong Yang, Serap Savari, H. Rusty Harris

JM3, Vol. 12, Issue 03, 033018, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.033018

KEYWORDS: Image processing, Image compression, Electron beams, Electron beam lithography, Computer programming, Semiconducting wafers, Associative arrays, Lithography, Binary data, Image storage

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Proceedings Article | 26 March 2013 Paper

Data delivery system for MAPPER using image compression

Jeehong Yang, Serap Savari

Proceedings Volume 8680, 86800Q (2013) https://doi.org/10.1117/12.2011298

KEYWORDS: Image processing, Electron beams, Image compression, Computer programming, Semiconducting wafers, Electron beam lithography, Associative arrays, Lithography, Binary data, Raster graphics

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Proceedings Article | 17 April 2012 Paper

Improvements on Corner2, a lossless layout image compression algorithm for maskless lithography systems

Jeehong Yang, Serap Savari

Proceedings Volume 8352, 83520K (2012) https://doi.org/10.1117/12.923205

KEYWORDS: Image compression, Image processing, Computer programming, Lithography, Associative arrays, Maskless lithography, Binary data, Photomasks, Raster graphics, Optical lithography

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Proceedings Article | 21 March 2012 Paper

Hardware implementation of Corner2 lossless compression algorithm for maskless lithography systems

Jeehong Yang, Xiaohui Li, Serap Savari

Proceedings Volume 8323, 83232O (2012) https://doi.org/10.1117/12.917581

KEYWORDS: Image processing, Image compression, Field programmable gate arrays, Computer programming, Maskless lithography, Lithography, Computer aided design, Binary data, Silicon, Data compression

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SPIE Journal Paper | 1 October 2011 Open Access

Lossless circuit layout image compression algorithm for maskless direct write lithography systems

Jeehong Yang, Serap Savari

JM3, Vol. 10, Issue 04, 043007, (October 2011) https://doi.org/10.1117/12.10.1117/1.3644620

KEYWORDS: Image compression, Computer programming, Image processing, Binary data, Maskless lithography, Lithography, Metals, Electron beams, Direct write lithography, Photomasks

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