CONFERENCE PROCEEDINGS
Advanced Search
Jinhong Kim
at Univ of Illinois
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 17 March 2023 Presentation
Microplasma exposure as a novel therapeutic treatment for otitis media demonstrated in a pre-clinical chinchilla model
Guillermo Monroy, Jinhong Kim, Alexander Ho, Andrey Mironov, Farzana Zaki, Darold Spillman, Gabrielle Choo-Kang, Jungeun Won, Peter Sun, Edita Aksamitiene, Marina Marjanovic, Eric Chaney, Thanh Huong Nguyen, J. Gary Eden, Stephen Boppart
Proceedings Volume PC12358, PC1235809 (2023) https://doi.org/10.1117/12.2648469
KEYWORDS: Ear, Chemical mechanical planarization, Optical coherence tomography, In vitro testing, Injuries, Animal model studies, Tissues, Resistance, Medicine, Instrument modeling
Proceedings Article | 1 August 2021 Presentation
Eco-friendly 3D micromachining of polymers by 172 nm photoablation for optical and microfluidics applications
Andrey Mironov, Sehyun Park, Thomas Reboli, Jinhong Kim, Dane Sievers, Sung-Jin Park, James Eden
Proceedings Volume 11801, 1180103 (2021) https://doi.org/10.1117/12.2594868
Proceedings Article | 5 March 2021 Presentation
Fabrication of optical components and micro- and nanofluidic devices in polymers by 172 nm direct photoablation
Proceedings Volume 11696, 116960K (2021) https://doi.org/10.1117/12.2583254
KEYWORDS: Polymers, Optical components, Vacuum ultraviolet, Polymethylmethacrylate, Photosensitive materials, Lamps, Excimers, Excimer lasers, Clean room processes
Proceedings Article | 10 March 2020 Presentation
172 nm patterning of optical components on polymers (Conference Presentation)
Andrey Mironov, Dane Sievers, Austin Steinforth, Jinhong Kim, Sung-Jin Park, James Eden
Proceedings Volume 11292, 112920T (2020) https://doi.org/10.1117/12.2546426
KEYWORDS: Polymers, Optical components, Optical lithography, Lamps, Vacuum ultraviolet, Excimer lasers, Cornea, Optical microcavities, Plasmas, Molecules
Proceedings Article | 9 September 2019 Presentation
Photo-ablation lithographic technique at 172 nm based upon flat excimer lamps (Conference Presentation)
Andrey Mironov, Dane Sievers, Jinhong Kim, Sung-Jin Park, James Eden
Proceedings Volume 11086, 110860M (2019) https://doi.org/10.1117/12.2529538
KEYWORDS: Lamps, Lithography, Excimers, Photoresist materials, Photoresist developing, Electron beam lithography, Polymers, Photomasks, Electron beams, Polymethylmethacrylate
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top