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Jinyu Li
at Univ of Science and Technology of China
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Publications (1)
Proceedings Article | 31 October 2016 Paper
Anti-reflective sub-wavelength structures at a wavelength of 441.6 nm for phase masks of near-field lithography
Jinyu Li, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu
Proceedings Volume 10022, 100220T (2016) https://doi.org/10.1117/12.2246381
KEYWORDS: Electron beam lithography, Antireflective coatings, Lithography, Near field, Photomasks, Interfaces, Reflectivity, Glasses, Diffraction, Stray light
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