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Dr. John McCoy
Senior Scientist/Consultant
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 21 July 2000 Paper
High-throughput NGL electron-beam direct-write lithography system
N. William Parker, Alan Brodie, John McCoy
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390042
KEYWORDS: Semiconducting wafers, Photomasks, Electron beam direct write lithography, Lithography, Microfabrication, Charged-particle lithography, Extreme ultraviolet lithography, Electron beam lithography, Charged particle optics, Electron beams
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