Proximity matching is a common activity in the wafer fabs1,2,3 for purposes such as
process transfer, capacity expansion, improved scanner yield and fab productivity. The
requirements on matching accuracy also become more and more stringent as CD error
budget shrinks with the feature size as technology advances. Various studies have been
carried out, using scanner knobs including NA, inner sigma, outer sigma, stage tilt,
ellipticity, and dose. In this paper, we present matching results for critical features of a
logic device, between an ASML XT:19x0i scanner and an XT:1700i (reference),
demonstrating the advantage of freeform illuminator pupil as part of the adjustable
knobs to provide additional flexibility. We also present the investigation of a novel
method using lens manipulators for proximity matching, effectively injecting scalar
wavefront to an XT:19x0i to mimic the behavior of the XT:1700i lens.
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