Kazuyuki Hagiwara
Senior Engineer at D2S KK
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 13 July 2017 Paper
Proceedings Volume 10454, 1045409 (2017) https://doi.org/10.1117/12.2280841
KEYWORDS: Photomasks, Computer simulations, Process modeling, Model-based design, Data modeling, Optical proximity correction, Electron beam lithography, Reactive ion etching, Computer aided design, Mask making

Proceedings Article | 28 June 2013 Paper
Yasuki Kimura, Takao Kubota, Kenji Kouno, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara
Proceedings Volume 8701, 87010H (2013) https://doi.org/10.1117/12.2028333
KEYWORDS: Photomasks, Data modeling, Model-based design, Process modeling, Critical dimension metrology, Mask making, Computer simulations, Logic, Lithography, Electron beams

Proceedings Article | 28 June 2013 Paper
Keisuke Ito, Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara
Proceedings Volume 8701, 87010A (2013) https://doi.org/10.1117/12.2027201
KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, 3D image processing, 3D metrology, Defect inspection, Optical inspection, Databases, Inspection

Proceedings Article | 8 November 2012 Paper
Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara, Anthony Adamov
Proceedings Volume 8522, 852226 (2012) https://doi.org/10.1117/12.964994
KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Image quality, Sensors, Signal detection, Databases, 3D metrology, Inspection

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 852207 (2012) https://doi.org/10.1117/12.964379
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Monte Carlo methods, Quality measurement, Lithography, Optical proximity correction, Model-based design, Error analysis, Data modeling

Proceedings Article | 8 November 2012 Paper
Yasuki Kimura, Ryuuji Yamamoto, Takao Kubota, Kenji Kouno, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara
Proceedings Volume 8522, 85221I (2012) https://doi.org/10.1117/12.958601
KEYWORDS: Photomasks, Data modeling, Model-based design, Mask making, Logic, Immersion lithography, Electron beams, Vestigial sideband modulation, SRAF, Modulation

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 782307 (2010) https://doi.org/10.1117/12.864094
KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Scanning electron microscopy, Vestigial sideband modulation, Printing, Data modeling, Manufacturing, Error analysis, System on a chip

Showing 5 of 7 publications
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