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Kosuke Koshijima
at Fujifilm Corp
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Publications (1)
Proceedings Article | 8 October 2014 Paper
Negative tone development process for ArF immersion extension
Kosuke Koshijima, Michihiro Shirakawa, So Kamimura, Keita Katou
Proceedings Volume 9235, 92350O (2014) https://doi.org/10.1117/12.2072470
KEYWORDS: Image processing, Nanoimprint lithography, Photomasks, Photoresist processing, Double patterning technology, Lithography, Optical lithography, Polymers, Scanning electron microscopy, Metals
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