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Mincheol Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
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Publications (1)
Proceedings Article | 21 November 2023 Presentation + Paper
Improvements on pattern fidelity at high curvature region of curvilinear mask with a novel method of MPC
Ai Kaneko, Taigo Fujii, Itaru Ono, Ahmad Syukri, Yohei Torigoe, Mincheol Kim, Sukho Lee, Eok Bong Kim, Sanghee Lee
Proceedings Volume 12751, 127510U (2023) https://doi.org/10.1117/12.2686942
KEYWORDS: Printing, Optical proximity correction, Photomasks, Lithography, Industry, Electromagnetic simulation, Deformation
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