Oliver Boomhower
at GE Research
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 30 August 2019 Paper
Proceedings Volume 11104, 111040G (2019) https://doi.org/10.1117/12.2530649
KEYWORDS: Etching, Collimation, Silicon, Semiconductor lasers, Lens design, Grayscale lithography, Fresnel lenses, Photoresist materials, Scanning electron microscopy, Tolerancing

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